Lai Kuan-Liang, Hon Min-Hsiung, Leu Ing-Chi
Department of Materials Science, National University of Tainan, Tainan 700, Taiwan.
Nanoscale Res Lett. 2011 Feb 21;6(1):157. doi: 10.1186/1556-276X-6-157.
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.
本文展示了一种通过模具辅助化学蚀刻工艺在铝表面制备图案化纳米压痕的简单且经济高效的方法。本报告展示了一种反应扩散方法，该方法通过化学蚀刻剂在聚二甲基硅氧烷印章中的吸收/释放行为形成纳米级浅蚀刻坑。在随后的阳极氧化过程中，可以获得由预图案化蚀刻坑引导的、间距为277 nm的有序纳米孔阵列。所获得的预图案化蚀刻坑可以在阳极氧化过程中引导阳极氧化铝纳米孔的生长，并有助于制备有序纳米孔阵列。
