通过 DNA 介导的 SiO2 刻蚀和掩蔽实现分子光刻。
Molecular lithography through DNA-mediated etching and masking of SiO2.
机构信息
Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.
出版信息
J Am Chem Soc. 2011 Aug 10;133(31):11868-71. doi: 10.1021/ja2038886. Epub 2011 Jul 19.
PMID:21751796
Abstract
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.
摘要
我们展示了一种新的自下而上纳米制造中图案转移的方法。我们表明，DNA 在单分子水平上促进/抑制了 SiO(2)的刻蚀，从而导致 DNA 到 SiO(2)衬底的负/正色调图案转移。
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