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硅片上DNA折纸晶格的表面辅助组装

Surface-Assisted Assembly of DNA Origami Lattices on Silicon Wafers.

作者信息

Parikka Johannes, Pothineni Bhanu Kiran, Järvinen Heini, Tapio Kosti, Keller Adrian, Toppari J Jussi

机构信息

Nanoscience Center and Department of Physics, University of Jyväskylä, Jyväskylä, Finland.

Department of Chemistry, Technical and Macromolecular Chemistry group, Paderborn University, Paderborn, Germany.

出版信息

Methods Mol Biol. 2025;2901:89-101. doi: 10.1007/978-1-0716-4394-5_7.

Abstract

During the last decade, the DNA origami technique has solidified its position as one of the most versatile methods for the fabrication of nanoscale structures, which can be further utilized as templates for a variety of devices and materials. The method has been utilized in many fields such as nanotechnology, photonics, material science, bioscience, and medicine. An especially promising application is the use of DNA origami nanostructures as lithography masks. Techniques such as DNA-assisted lithography have recently been developed to provide the resolution of e-beam lithography, i.e., a few nanometers, without time consuming and costly patterning steps. Especially intriguing is the use of self-organized DNA origami lattices to fabricate large surfaces with nanoscale features to achieve metamaterials via a cost-effective and practical way. Such self-organized DNA origami lattices have been realized over macroscopic surface areas on mica surfaces, which is a common substrate in DNA origami research. However, mica is not suitable for further processing, and transferring this technique to silicon substrates, the most used substrate in microfabrication, has been challenging. In this chapter, we present and discuss two successfully demonstrated approaches for the fabrication of ordered DNA origami lattices on oxidized silicon surfaces.

摘要

在过去十年中,DNA折纸技术已巩固其作为制造纳米级结构最通用方法之一的地位,这些纳米级结构可进一步用作各种器件和材料的模板。该方法已应用于许多领域,如纳米技术、光子学、材料科学、生物科学和医学。一个特别有前景的应用是将DNA折纸纳米结构用作光刻掩模。最近已开发出如DNA辅助光刻等技术,以提供电子束光刻的分辨率,即几纳米,而无需耗时且昂贵的图案化步骤。特别引人关注的是利用自组装DNA折纸晶格来制造具有纳米级特征的大表面,从而通过一种经济高效且实用的方式实现超材料。这种自组装DNA折纸晶格已在云母表面的宏观表面积上实现,云母是DNA折纸研究中常用的基质。然而,云母不适合进一步加工,将该技术转移到微制造中最常用的硅衬底上一直具有挑战性。在本章中,我们展示并讨论了两种在氧化硅表面制造有序DNA折纸晶格的成功方法。

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