IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, United States.
ACS Nano. 2011 Oct 25;5(10):7812-7. doi: 10.1021/nn201809k. Epub 2011 Aug 25.
Graphene's single atomic layer of sp(2) carbon has recently garnered much attention for its potential use in electronic applications. Here, we report a memory application for graphene, which we call graphene flash memory (GFM). GFM has the potential to exceed the performance of current flash memory technology by utilizing the intrinsic properties of graphene, such as high density of states, high work function, and low dimensionality. To this end, we have grown large-area graphene sheets by chemical vapor deposition and integrated them into a floating gate structure. GFM displays a wide memory window of ∼6 V at significantly low program/erase voltages of ±7 V. GFM also shows a long retention time of more than 10 years at room temperature. Additionally, simulations suggest that GFM suffers very little from cell-to-cell interference, potentially enabling scaling down far beyond current state-of-the-art flash memory devices.
石墨烯的单层 sp(2) 杂化碳原子最近因其在电子应用中的潜在用途而受到广泛关注。在这里,我们报告了一种用于石墨烯的存储应用,我们称之为石墨烯闪存 (GFM)。GFM 有可能通过利用石墨烯的固有特性,如高密度状态、高功函数和低维性,超越当前闪存技术的性能。为此,我们通过化学气相沉积生长了大面积的石墨烯片,并将其集成到浮栅结构中。GFM 在显著低的 ±7 V 编程/擦除电压下显示出约 6 V 的宽存储窗口。GFM 还在室温下表现出超过 10 年的长保持时间。此外,模拟表明 GFM 受单元间干扰的影响很小,有可能使器件缩小到远远超出当前最先进的闪存器件的程度。