Chun Sung-Yong
Department of Advanced Materials and Engineering, Mokpo National University, 61 Dorim, Chunggye, Muan, Jeonnam 534-729, Korea.
J Nanosci Nanotechnol. 2011 Aug;11(8):7378-81. doi: 10.1166/jnn.2011.4794.
Nano fabrication technology of superhard TiN films with sub-nanometered crystallites was developed using an Inductively coupled plasma (ICP) during deposition. Nanocrystalline TiN coatings were fabricated by ICP assisted sputtering and the properies of the coatings were investigated. The ICP assisted TiN coatings showed a much higher nano-hardness (>43 GPa) compared to coatings produced by the conventional DC sputtering process. The ICP assisited TiN coatings also showed superior properties in dense microstructure and surface roughness compared to the DC sputtered TiN coatings. The superior mechanical properties of ICP assistted TiN coatings were attributed to the fine and dense microstructure and high compressive residual stress.
在沉积过程中使用电感耦合等离子体（ICP）开发了具有亚纳米微晶的超硬TiN薄膜的纳米制造技术。通过ICP辅助溅射制备了纳米晶TiN涂层，并对涂层的性能进行了研究。与传统直流溅射工艺制备的涂层相比，ICP辅助TiN涂层显示出更高的纳米硬度（>43 GPa）。与直流溅射TiN涂层相比，ICP辅助TiN涂层在致密微观结构和表面粗糙度方面也表现出优异的性能。ICP辅助TiN涂层优异的力学性能归因于其精细致密的微观结构和高压缩残余应力。
