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电感耦合等离子体对用于耐腐蚀表面的纳米晶氮化钒薄膜性能的影响。

Effect of Inductively Coupled Plasma on the Properties of Nanocrystalline Vanadium Nitride Films for Corrosion Resistant Surface.

作者信息

Chun Sung-Yong

机构信息

Department of Advanced Materials Science and Engineering, Mokpo National University, Jeonnam 534-729, Republic of Korea.

出版信息

J Nanosci Nanotechnol. 2018 Mar 1;18(3):2258-2261. doi: 10.1166/jnn.2018.14975.

Abstract

Single-phase cubic (FCC) vanadium nitride (VN) coatings with different preferential orientations and residual stresses were obtained as a function of ICP power. Microstructural, crystallographic and mechanical characterizations were performed by FE-SEM, AFM, XRD and nanoindentation. The results show that ICP has significant effects on coating's microstructure, structural and mechanical properties of VN coatings. With an increase in ICP power, coating microstructure evolved from a porous columnar structure to a highly dense one. Single-phase cubic (FCC) VN coatings with different preferential orientations and residual stresses were obtained as a function of ICP power. Average crystal grain sizes of single phase cubic VN coatings were decreased from 10.1 nm to 4.0 nm with an increase in ICP power. Maximum hardness of 28.2 GPa was obtained for the coatings deposited at ICP power of 200 W.

摘要

通过改变电感耦合等离子体(ICP)功率,获得了具有不同择优取向和残余应力的单相立方(面心立方,FCC)氮化钒(VN)涂层。采用场发射扫描电子显微镜(FE-SEM)、原子力显微镜(AFM)、X射线衍射仪(XRD)和纳米压痕技术对涂层的微观结构、晶体结构和力学性能进行了表征。结果表明,ICP对VN涂层的微观结构、结构和力学性能有显著影响。随着ICP功率的增加,涂层微观结构从多孔柱状结构演变为高度致密的结构。通过改变ICP功率,获得了具有不同择优取向和残余应力的单相立方(FCC)VN涂层。随着ICP功率的增加,单相立方VN涂层的平均晶粒尺寸从10.1nm减小到4.0nm。在200W的ICP功率下沉积的涂层获得了28.2GPa的最大硬度。

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