Department of Materials Science and Engineering, University of Wisconsin-Madison, WI, USA.
Adv Mater. 2012 Feb 21;24(8):1041-5. doi: 10.1002/adma.201104195. Epub 2012 Jan 26.
A novel approach for the rational synthesis of low-defect density, patterned graphene from the bottom up, called barrier-guided chemical vapor deposition, is introduced. A patterned barrier layer impedes the growth of graphene in selected areas of the copper substrate, guiding the growth of graphene into desired micro- and nano- structures with control over placement, orientation, and spatial and lateral extent.
本文介绍了一种新的方法，用于从底部向上合理合成低缺陷密度的图案化石墨烯，称为障碍引导化学气相沉积。图案化的障碍层阻碍了铜衬底选定区域内石墨烯的生长，引导石墨烯生长成所需的微纳米结构，从而可以控制其位置、取向以及空间和横向扩展。
