Koutouzis Theofilos, Gadalla Hana, Kettler Zachary, Elbarasi Amelsaad, Nonhoff Jörg
Department of Periodontology, College of Dentistry, University of Florida, Gainesville, FL, USA.
Department of Global Scientific Affairs-Clinical Research, DENTSPLY Implants Manufacturing GmbH, Mannheim, Germany.
Clin Implant Dent Relat Res. 2015 Jun;17(3):476-82. doi: 10.1111/cid.12158. Epub 2013 Sep 23.
The aim of this study is to assess the risk of endotoxin penetration to the implant-abutment interface (IAI) of implants with Morse-taper connection and the effect of chlorhexidine in the prevention of such penetration.
Thirty implants with Morse-taper connection were divided into three groups (n = 10/group) based on type of inoculation of the internal aspect of the implant. Implants in Group 1 were inoculated with 1 μl Escherichia coli for 24 hours; supernatant was removed and 0.5 μl of sterile saline was added. Implants in Group 2 were inoculated with 1 μl E. coli for 24 hours; supernatant was removed and 0.5 μl 0.2% chlorhexidine solution was added. Implants in Group 3 were inoculated with 0.5 μl of sterile saline and served as controls. Following inoculation procedures, implants were connected to standard abutments, immersed in sterile culture media, and loaded with 200,000 cycles of 160 N in a wear simulator. Samples were collected from the supernatant solution of each implant for endotoxin identification at the beginning of the loading cycle (T0) and following 9 hours (T9), 18 hours (T18), 27 hours (T27), 36 hours (T36), 45 hours (T45), and 54 hours (T54).
For Group 1 and Group 2, there were statistically significant differences between the endotoxin concentration at T0 and the endotoxin concentration at the subsequent sampling points (p < .05 Kruskal-Wallis with Bonferoni corrections for intragroup comparisons). There were no statistically significant differences between Group 1 and Group 2 at all sampling points.
This study indicates that bacterial endotoxin can penetrate the IAI of implants with Morse-taper connection, and 0.2% chlorhexidine solution had no significant effect on that penetration.
本研究旨在评估内毒素渗透至具有莫氏锥度连接的种植体-基台界面（IAI）的风险，以及氯己定在预防此类渗透方面的作用。
30颗具有莫氏锥度连接的种植体根据种植体内侧接种类型分为三组（每组n = 10）。第1组种植体接种1μl大肠杆菌24小时；去除上清液并加入0.5μl无菌盐水。第2组种植体接种1μl大肠杆菌24小时；去除上清液并加入0.5μl 0.2%氯己定溶液。第3组种植体接种0.5μl无菌盐水作为对照。接种程序完成后，将种植体连接至标准基台，浸入无菌培养基中，并在磨损模拟器中以160 N进行200,000次循环加载。在加载循环开始时（T0）以及9小时（T9）、18小时（T18）、27小时（T27）、36小时（T36）、45小时（T45）和54小时（T54）从每个种植体的上清液中采集样本用于内毒素鉴定。
对于第1组和第2组，T0时的内毒素浓度与后续采样点的内毒素浓度之间存在统计学显著差异（经Bonferroni校正的组内比较的Kruskal-Wallis检验，p < 0.05）。在所有采样点，第1组和第2组之间均无统计学显著差异。
本研究表明细菌内毒素可渗透至具有莫氏锥度连接的种植体的IAI，且0.2%氯己定溶液对此类渗透无显著作用。
