用于生物应用的等离子体改性聚四氟乙烯的研究：抗蛋白质性能、等离子体处理、表面组成与表面粗糙度之间的关系。
Study of plasma modified-PTFE for biological applications: relationship between protein resistant properties, plasma treatment, surface composition and surface roughness.
作者信息
Vandencasteele Nicolas, Nisol Bernard, Viville Pascal, Lazzaroni Roberto, Castner David G, Reniers François
机构信息
Université Libre de Bruxelles, Faculty of Sciences, Analytical and Interfacial Chemistry, cp 255, bld Triomphe 2, B-1050 Bruxelles, Belgium.
Laboratory for Chemistry of NoVel Materials, Université de Mons-Hainaut/Materia NoVa, Place du Parc, 20, B-7000 Mons, Belgium.
出版信息
Plasma Process Polym. 2008 Sep 15;5(7):661-671. doi: 10.1002/ppap.200700143.
PTFE samples were treated by low-pressure, O RF plasmas. The adsorption of BSA was used as a probe for the protein resistant properties. The exposure of PTFE to an O plasma leads to an increase in the chamber pressure. OES reveals the presence of CO, CO and F in the gas phase, indicating a strong etching of the PTFE surface by the O plasma. Furthermore, the high resolution C1s spectrum shows the appearance of CF, CF and C-CF components in addition to the CF component, which is consistent with etching of the PTFE surface. WCA as high as 160° were observed, indicating a superhydrophobic behaviour. AFM Images of surfaces treated at high plasma power showed a increase in roughness. Lower amounts of BSA adsorption were detected on high power, O plasma-modified PTFE samples compared to low power, oxygen plasma-modified ones.
聚四氟乙烯（PTFE）样品采用低压氧射频等离子体进行处理。牛血清白蛋白（BSA）的吸附用作抗蛋白质性能的探针。PTFE暴露于氧等离子体导致腔室压力升高。发射光谱（OES）显示气相中存在CO、CO和F，表明氧等离子体对PTFE表面有强烈蚀刻作用。此外，高分辨率C1s光谱显示除了CF成分外，还出现了CF、CF和C-CF成分，这与PTFE表面的蚀刻情况一致。观察到接触角（WCA）高达160°，表明具有超疏水行为。在高等离子体功率下处理的表面的原子力显微镜（AFM）图像显示粗糙度增加。与低功率氧等离子体改性的聚四氟乙烯样品相比，在高功率氧等离子体改性的聚四氟乙烯样品上检测到的BSA吸附量更低。
Zotero 插件