• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

具有高介电常数氧化铝介质的高性能溶液处理氧化锡薄膜晶体管,工作在增强模式下。

High-mobility solution-processed tin oxide thin-film transistors with high-κ alumina dielectric working in enhancement mode.

机构信息

Key Lab of Organic Optoelectronics & Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University , Beijing 100084, P. R. China.

出版信息

ACS Appl Mater Interfaces. 2014 Dec 10;6(23):20786-94. doi: 10.1021/am5050295. Epub 2014 Nov 19.

DOI:10.1021/am5050295
PMID:25375760
Abstract

Solution-processed metal oxide thin-film transistors (TFTs) operating in enhancement mode are promising for the next-generation flat panel displays. In this work, we report high-mobility TFTs based on SnO2 active layer derived from a soluble tin(II) 2-ethylhexanoate precursor. Densely packed polycrystalline SnO2 thin films with moderate oxygen vacancies and only a few hydroxides are obtained via systemically optimizing precursor concentrations and processing conditions. The utilization of a solution-processed high-κ Al2O3 insulating layer could generate a coherent dielectric/semiconductor interface, hence further improving the device performance. TFT devices with an average field-effect mobility of 96.4 cm(2) V(-1) s(-1), a current on/off ratio of 2.2 × 10(6), a threshold voltage of 1.72 V, and a subthreshold swing of 0.26 V dec(-1) have been achieved, and the driving capability is demonstrated by implementing a single SnO2 TFT device to tune the brightness of an organic light-emitting diode. It is worth noting that these TFTs work in enhancement mode at low voltages less than 4 V, which sheds light on their potential application to the next-generation low-cost active matrix flat panel displays.

摘要

溶液处理的金属氧化物薄膜晶体管(TFTs)在增强模式下工作,有望成为下一代平板显示器的首选。在这项工作中,我们报告了基于 SnO2 有源层的高迁移率 TFTs,SnO2 有源层由可溶性锡(II)2-乙基己酸酯前体制备。通过系统优化前体浓度和处理条件,得到了具有中等氧空位和少量氢氧化物的致密多晶 SnO2 薄膜。采用溶液处理的高介电常数 Al2O3 绝缘层可以产生相干的介电/半导体界面,从而进一步提高器件性能。具有平均场效应迁移率为 96.4 cm2 V-1 s-1、电流开关比为 2.2×106、阈值电压为 1.72 V 和亚阈值摆幅为 0.26 V dec-1 的 TFT 器件已经实现,通过实施单个 SnO2 TFT 器件来调节有机发光二极管的亮度,展示了其驱动能力。值得注意的是,这些 TFTs 在低至 4 V 以下的电压下以增强模式工作,这为它们在下一代低成本有源矩阵平板显示器中的潜在应用提供了启示。

相似文献

1
High-mobility solution-processed tin oxide thin-film transistors with high-κ alumina dielectric working in enhancement mode.具有高介电常数氧化铝介质的高性能溶液处理氧化锡薄膜晶体管,工作在增强模式下。
ACS Appl Mater Interfaces. 2014 Dec 10;6(23):20786-94. doi: 10.1021/am5050295. Epub 2014 Nov 19.
2
Synergistic effects of water addition and step heating on the formation of solution-processed zinc tin oxide thin films: towards high-mobility polycrystalline transistors.水的添加和分步加热对溶液法制备锌锡氧化物薄膜的协同作用:制备高迁移率多晶晶体管。
Nanotechnology. 2016 Nov 18;27(46):465204. doi: 10.1088/0957-4484/27/46/465204. Epub 2016 Oct 19.
3
Low-voltage operation of ZrO2-gated n-type thin-film transistors based on a channel formed by hybrid phases of SnO and SnO2.基于由SnO和SnO2混合相形成的沟道的ZrO2栅控n型薄膜晶体管的低压操作。
ACS Appl Mater Interfaces. 2015 Jul 22;7(28):15129-37. doi: 10.1021/acsami.5b02941. Epub 2015 Jul 13.
4
A mixed solution-processed gate dielectric for zinc-tin oxide thin-film transistor and its MIS capacitance.一种混合溶液处理的锌锡氧化物薄膜晶体管栅介质及其 MIS 电容。
Sci Rep. 2016 Sep 19;6:33576. doi: 10.1038/srep33576.
5
High-Quality Solution-Processed Silicon Oxide Gate Dielectric Applied on Indium Oxide Based Thin-Film Transistors.应用于基于氧化铟的薄膜晶体管的高质量溶液法制备氧化硅栅介质
ACS Appl Mater Interfaces. 2015 Jul 1;7(25):14011-7. doi: 10.1021/acsami.5b03105. Epub 2015 Jun 18.
6
Fully solution-processed low-voltage aqueous In2O3 thin-film transistors using an ultrathin ZrO(x) dielectric.使用超薄 ZrO(x) 电介质的全溶液处理低电压水性 In2O3 薄膜晶体管。
ACS Appl Mater Interfaces. 2014 Oct 22;6(20):17364-9. doi: 10.1021/am505602w. Epub 2014 Oct 9.
7
High-performance solution-processed amorphous zinc-indium-tin oxide thin-film transistors.高性能溶液处理非晶态锌铟锡氧化物薄膜晶体管。
J Am Chem Soc. 2010 Aug 4;132(30):10352-64. doi: 10.1021/ja100615r.
8
Self-aligned top-gate amorphous indium zinc oxide thin-film transistors exceeding low-temperature poly-Si transistor performance.自对准顶栅非晶氧化铟锌薄膜晶体管超越低温多晶硅晶体管性能。
ACS Appl Mater Interfaces. 2013 Aug 14;5(15):6990-5. doi: 10.1021/am401128p. Epub 2013 Jul 17.
9
Impact of the cation composition on the electrical performance of solution-processed zinc tin oxide thin-film transistors.阳离子组成对溶液法制备的氧化锌锡薄膜晶体管电学性能的影响。
ACS Appl Mater Interfaces. 2014 Aug 27;6(16):14026-36. doi: 10.1021/am503351e. Epub 2014 Aug 12.
10
Performance Enhancement of ZITO Thin-Film Transistors via Graphene Bridge Layer by Sol-Gel Combustion Process.通过溶胶-凝胶燃烧法制备的石墨烯桥层增强ZITO薄膜晶体管的性能
ACS Appl Mater Interfaces. 2015 Nov 4;7(43):24103-9. doi: 10.1021/acsami.5b07148. Epub 2015 Oct 26.

引用本文的文献

1
Improving the Thermal Stability of Indium Oxide n-Type Field-Effect Transistors by Enhancing Crystallinity through Ultrahigh-Temperature Rapid Thermal Annealing.通过超高温快速热退火提高结晶度来改善氧化铟n型场效应晶体管的热稳定性。
ACS Appl Mater Interfaces. 2025 Jan 22;17(3):5078-5085. doi: 10.1021/acsami.4c18435. Epub 2025 Jan 9.
2
Gas Sensors Based on Semiconductor Metal Oxides Fabricated by Electrospinning: A Review.基于静电纺丝法制备的半导体金属氧化物气体传感器综述
Sensors (Basel). 2024 May 7;24(10):2962. doi: 10.3390/s24102962.
3
Influence of NF Plasma-Treated HfO Gate Insulator Surface on Tin Oxide Thin-Film Transistors.
氮氟等离子体处理的氧化铪栅极绝缘体表面对氧化锡薄膜晶体管的影响。
Materials (Basel). 2023 Nov 15;16(22):7172. doi: 10.3390/ma16227172.
4
Atomically Thin Amorphous Indium-Oxide Semiconductor Film Developed Using a Solution Process for High-Performance Oxide Transistors.采用溶液法制备的用于高性能氧化物晶体管的原子级超薄非晶氧化铟半导体薄膜
Nanomaterials (Basel). 2023 Sep 16;13(18):2568. doi: 10.3390/nano13182568.
5
All-Water-Driven High-k HfO Gate Dielectrics and Applications in Thin Film Transistors.全水驱动的高k HfO栅极电介质及其在薄膜晶体管中的应用。
Nanomaterials (Basel). 2023 Feb 10;13(4):694. doi: 10.3390/nano13040694.
6
Application of Solution Method to Prepare High Performance Multicomponent Oxide Thin Films.溶液法在制备高性能多组分氧化物薄膜中的应用。
Membranes (Basel). 2022 Jun 22;12(7):641. doi: 10.3390/membranes12070641.
7
Understanding the Origin of the Hysteresis of High-Performance Solution Processed Polycrystalline SnO Thin-Film Transistors and Applications to Circuits.理解高性能溶液法制备的多晶SnO薄膜晶体管滞后现象的起源及其在电路中的应用。
Membranes (Basel). 2021 Dec 22;12(1):7. doi: 10.3390/membranes12010007.
8
Bias Stress Stability of Solution-Processed Nano Indium Oxide Thin Film Transistor.溶液处理的纳米氧化铟薄膜晶体管的偏置应力稳定性
Micromachines (Basel). 2021 Jan 22;12(2):111. doi: 10.3390/mi12020111.
9
Amorphous Tin Oxide Applied to Solution Processed Thin-Film Transistors.应用于溶液处理薄膜晶体管的非晶氧化锡
Materials (Basel). 2019 Oct 14;12(20):3341. doi: 10.3390/ma12203341.