Lai Guan-Yu, Kumar Dinesh P, Pei Zingway
Department of Electrical Engineering, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan.
Department of Electrical Engineering, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan ; Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan ; Nanoscience and Nanotechnology Research Center, National Chung Hsing University, 250 Ku-Kang Rd, Taichung 402, Taiwan.
Nanoscale Res Lett. 2014 Dec 3;9(1):654. doi: 10.1186/1556-276X-9-654. eCollection 2014.
In this study, we applied a metal catalyst etching method to fabricate a nano/microhole array on a Si substrate for application in solar cells. In addition, the surface of an undesigned area was etched because of the attachment of metal nanoparticles that is dissociated in a solution. The nano/microhole array exhibited low specular reflectance (<1%) without antireflection coating because of its rough surface. The solar spectrum related total reflection was approximately 9%. A fabricated solar cell with a 40-μm hole spacing exhibited an efficiency of 9.02%. Comparing to the solar cell made by polished Si, the external quantum efficiency for solar cell with 30 s etching time was increased by 16.7%.
在本研究中，我们应用金属催化剂蚀刻法在硅衬底上制备纳米/微孔阵列，以用于太阳能电池。此外，由于溶液中解离的金属纳米颗粒附着，未设计区域的表面被蚀刻。由于其粗糙表面，纳米/微孔阵列在没有抗反射涂层的情况下表现出低镜面反射率（<1%）。与太阳光谱相关的全反射约为9%。制备的孔间距为40μm的太阳能电池效率为9.02%。与抛光硅制成的太阳能电池相比，蚀刻时间为30s的太阳能电池的外量子效率提高了16.7%。
