通过胶态量子点固体内点到点的相互表面钝化来记录载流子扩散长度。
Record Charge Carrier Diffusion Length in Colloidal Quantum Dot Solids via Mutual Dot-To-Dot Surface Passivation.
机构信息
Department of Electrical and Computer Engineering, University of Toronto, 10 King's College Road, Toronto, Ontario, M5S 3G4, Canada.
出版信息
Adv Mater. 2015 Jun 3;27(21):3325-30. doi: 10.1002/adma.201405782. Epub 2015 Apr 21.
PMID:25899173
Abstract
Through a combination of chemical and mutual dot-to-dot surface passivation, high-quality colloidal quantum dot solids are fabricated. The joint passivation techniques lead to a record diffusion length for colloidal quantum dots of 230 ± 20 nm. The technique is applied to create thick photovoltaic devices that exhibit high current density without losing fill factor.
摘要
通过化学和相互点状表面钝化的组合，制备出高质量的胶体量子点固体。联合钝化技术使胶体量子点的记录扩散长度达到 230±20nm。该技术被应用于创建厚光伏器件，在不损失填充因子的情况下表现出高电流密度。
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