†Applied Science and Technology Graduate Program, University of California at Berkeley, Berkeley, California 94720, United States.
‡Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States.
Nano Lett. 2015 Jul 8;15(7):4657-63. doi: 10.1021/acs.nanolett.5b01429. Epub 2015 Jun 25.
Noncrystalline semiconductor materials often exhibit hysteresis in charge transport measurements whose mechanism is largely unknown. Here we study the dynamics of charge injection and transport in PbS quantum dot (QD) monolayers in a field effect transistor (FET). Using Kelvin probe force microscopy, we measured the temporal response of the QDs as the channel material in a FET following step function changes of gate bias. The measurements reveal an exponential decay of mobile carrier density with time constants of 3-5 s for holes and ∼10 s for electrons. An Ohmic behavior, with uniform carrier density, was observed along the channel during the injection and transport processes. These slow, uniform carrier trapping processes are reversible, with time constants that depend critically on the gas environment. We propose that the underlying mechanism is some reversible electrochemical process involving dissociation and diffusion of water and/or oxygen related species. These trapping processes are dynamically activated by the injected charges, in contrast with static electronic traps whose presence is independent of the charge state. Understanding and controlling these processes is important for improving the performance of electronic, optoelectronic, and memory devices based on disordered semiconductors.
非晶半导体材料在电荷输运测量中常常表现出滞后现象,其机制在很大程度上尚不清楚。在这里,我们研究了在场效应晶体管 (FET) 中 PbS 量子点 (QD) 单层中电荷注入和输运的动力学。我们使用 Kelvin 探针力显微镜测量了作为 FET 沟道材料的 QD 在栅极偏压阶跃函数变化后的时间响应。测量结果表明,空穴的载流子密度随时间呈指数衰减,时间常数为 3-5 秒,而电子的时间常数约为 10 秒。在注入和输运过程中,沿沟道观察到欧姆行为,具有均匀的载流子密度。这些缓慢、均匀的载流子俘获过程是可逆的,其时间常数取决于气体环境的临界依赖性。我们提出,潜在的机制是涉及水和/或与氧相关物质的离解和扩散的一些可逆电化学过程。这些俘获过程是由注入电荷动态激活的,与独立于电荷状态存在的静态电子陷阱相反。了解和控制这些过程对于提高基于无序半导体的电子、光电和存储器件的性能非常重要。