National Physical Laboratory (NPL) , Teddington, Middlesex, TW110LW, United Kingdom.
Department of Chemical Engineering, Texas Materials Institute and Center for Nano and Molecular Science and Technology, The University of Texas , Austin, Texas 78712-1062, United States.
ACS Nano. 2016 Apr 26;10(4):4384-94. doi: 10.1021/acsnano.6b00005. Epub 2016 Mar 28.
Semiconducting nanowires (NWs) are becoming essential nanobuilding blocks for advanced devices from sensors to energy harvesters, however their full technology penetration requires large scale materials synthesis together with efficient NW assembly methods. We demonstrate a scalable one-step solution process for the direct selection, collection, and ordered assembly of silicon NWs with desired electrical properties from a poly disperse collection of NWs obtained from a supercritical fluid-liquid-solid growth process. Dielectrophoresis (DEP) combined with impedance spectroscopy provides a selection mechanism at high signal frequencies (>500 kHz) to isolate NWs with the highest conductivity and lowest defect density. The technique allows simultaneous control of five key parameters in NW assembly: selection of electrical properties, control of NW length, placement in predefined electrode areas, highly preferential orientation along the device channel, and control of NWs deposition density from few to hundreds per device. Direct correlation between DEP signal frequency and deposited NWs conductivity is confirmed by field-effect transistor and conducting AFM data. Fabricated NW transistor devices demonstrate excellent performance with up to 1.6 mA current, 10(6)-10(7) on/off ratio and hole mobility of 50 cm(2) V(-1) s(-1).
半导体纳米线(NWs)正成为从传感器到能量收集器等先进器件的重要纳米构建块,然而,要实现其全面技术渗透,需要大规模的材料合成以及高效的 NW 组装方法。我们展示了一种可扩展的一步解决方案,用于从超临界流-液-固生长过程中获得的多分散 NW 收集物中直接选择、收集和有序组装具有所需电性能的硅 NW。介电泳(DEP)与阻抗谱相结合,提供了一种在高信号频率(>500 kHz)下的选择机制,以隔离具有最高电导率和最低缺陷密度的 NW。该技术允许同时控制 NW 组装中的五个关键参数:电性能的选择、NW 长度的控制、在预定电极区域中的放置、沿器件通道的高度优先取向,以及从每个器件的几个到数百个 NW 的沉积密度的控制。通过场效应晶体管和导电原子力显微镜数据证实了 DEP 信号频率与沉积 NW 电导率之间的直接相关性。制造的 NW 晶体管器件具有出色的性能,最大电流为 1.6 mA,10(6)-10(7)的导通/关断比和 50 cm(2) V(-1) s(-1)的空穴迁移率。