imec, Kapeldreef 75, B-3001 Leuven, Belgium.
Nanoscale. 2017 Jan 7;9(1):258-265. doi: 10.1039/c6nr06980k. Epub 2016 Dec 1.
Despite rapid progress in 2D molybdenum disulfide (MoS) research in recent years, MoS field-effect transistors (FETs) still suffer from a high metal-to-MoS contact resistance and low intrinsic mobility, which are major hindrances to their future application. We report an efficient technique to dope thin-film MoS FETs using a poly(vinyl-alcohol) (PVA) polymeric coating. This results in a reduction of the contact resistance by up to 30% as well as a reduction in the channel resistance to 20 kΩ sq. Using a dehydration process, we were able to effectively control the surface interactions between MoS and the more electropositive hydroxyl groups (-OH) of PVA, which provided a controllable and yet reversible increase in the charge carrier density to a value of 8.0 × 10 cm. The non-covalent, thus non-destructive, PVA doping of MoS increases the carrier concentration without degrading the mobility, which shows a monotonic increase while enhancing the doping effect. The PVA doping technique is then exploited to create heavily doped access regions to the intrinsic MoS channel, which yields 200% increase of the ON-state source-drain current. This establishes PVA doping as an effective approach to enhance the transport properties of MoS FETs for a variety of applications.
尽管近年来二维二硫化钼(MoS)研究取得了快速进展,但 MoS 场效应晶体管(FET)仍然存在金属与 MoS 接触电阻高和本征迁移率低的问题,这严重阻碍了其未来的应用。我们报告了一种使用聚乙烯醇(PVA)聚合物涂层掺杂薄膜 MoS FET 的有效技术。这导致接触电阻降低了 30%,同时将沟道电阻降低到 20 kΩ sq。通过脱水过程,我们能够有效地控制 MoS 与 PVA 中带正电的羟基(-OH)之间的表面相互作用,从而提供了一种可控且可还原的载流子密度增加,达到 8.0×10 cm 的值。非共价的、因此是非破坏性的 PVA 掺杂 MoS 会增加载流子浓度而不会降低迁移率,这表明在增强掺杂效应的同时,迁移率呈单调增加。然后,我们利用 PVA 掺杂技术在本征 MoS 沟道上创建重掺杂的接入区域,从而使导通状态源-漏电流增加了 200%。这表明 PVA 掺杂是一种有效的方法,可以增强 MoS FET 的传输性能,适用于各种应用。