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氧空位对 β-GaO 结构和光学性质的影响。

Effects of oxygen vacancies on the structural and optical properties of β-GaO.

机构信息

Wide Bandgap Semiconductor Technology Disciplines State Key Laboratory, Xidian University, Xi'an 710071, China.

出版信息

Sci Rep. 2017 Jan 9;7:40160. doi: 10.1038/srep40160.

Abstract

The structural, electronic, and optical properties of β-GaO with oxygen vacancies are studied by employing first-principles calculations based on density function theory. Based on the defects formation energies, we conclude the oxygen vacancies are most stable in their fully charge states. The electronic structures and optical properties of β-GaO are calculated by Generalized Gradient Approximation + U formalisms with the Hubbard U parameters set 7.0 eV and 8.5 eV for Ga and O ions, respectively. The calculated bandgap is 4.92 eV, which is consistent with the experimental value. The static real dielectric constants of the defective structures are increased compared with the intrinsic one, which is attributed to the level caused by the Ga-4s states in the bandgap. Extra peaks are introduced in the absorption spectra, which are related to Ga-4s and O-2p states. Experimentally, β-GaO films are deposited under different O volume percentage with ratio-frequency magnetron sputtering method. The measured results indicate that oxygen vacancies can induce extra emission peaks in the photoluminescence spectrum, the location of these peaks are close to the calculated results. Extra O can increase the formation energies of oxygen vacancies and thus reduce oxygen vacancies in β-GaO.

摘要

采用基于密度泛函理论的第一性原理计算研究了具有氧空位的β-GaO 的结构、电子和光学性质。根据缺陷形成能,我们得出结论,氧空位在其完全荷电状态下最稳定。通过广义梯度近似+U 形式理论,使用 Ga 和 O 离子的 Hubbard U 参数分别为 7.0 eV 和 8.5 eV,计算了β-GaO 的电子结构和光学性质。计算出的带隙为 4.92 eV,与实验值一致。与本征结构相比,缺陷结构的静态实介电常数增加,这归因于带隙中 Ga-4s 态引起的能级。吸收光谱中引入了额外的峰,这与 Ga-4s 和 O-2p 态有关。实验上,采用射频磁控溅射法在不同的 O 体积百分比下沉积β-GaO 薄膜。测量结果表明,氧空位可以在光致发光谱中诱导额外的发射峰,这些峰的位置与计算结果接近。额外的 O 可以增加氧空位的形成能,从而减少β-GaO 中的氧空位。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3dc6/5220324/fa7de55e39cd/srep40160-f1.jpg

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