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非封装超薄半导体BiOSe中的高电子迁移率和量子振荡。

High electron mobility and quantum oscillations in non-encapsulated ultrathin semiconducting BiOSe.

作者信息

Wu Jinxiong, Yuan Hongtao, Meng Mengmeng, Chen Cheng, Sun Yan, Chen Zhuoyu, Dang Wenhui, Tan Congwei, Liu Yujing, Yin Jianbo, Zhou Yubing, Huang Shaoyun, Xu H Q, Cui Yi, Hwang Harold Y, Liu Zhongfan, Chen Yulin, Yan Binghai, Peng Hailin

机构信息

Center for Nanochemistry, Beijing National Laboratory for Molecular Sciences (BNLMS), College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China.

National Laboratory of Solid-State Microstructures, College of Engineering and Applied Sciences, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China.

出版信息

Nat Nanotechnol. 2017 Jul;12(6):530-534. doi: 10.1038/nnano.2017.43. Epub 2017 Apr 3.

Abstract

High-mobility semiconducting ultrathin films form the basis of modern electronics, and may lead to the scalable fabrication of highly performing devices. Because the ultrathin limit cannot be reached for traditional semiconductors, identifying new two-dimensional materials with both high carrier mobility and a large electronic bandgap is a pivotal goal of fundamental research. However, air-stable ultrathin semiconducting materials with superior performances remain elusive at present. Here, we report ultrathin films of non-encapsulated layered BiOSe, grown by chemical vapour deposition, which demonstrate excellent air stability and high-mobility semiconducting behaviour. We observe bandgap values of ∼0.8 eV, which are strongly dependent on the film thickness due to quantum-confinement effects. An ultrahigh Hall mobility value of >20,000 cm V s is measured in as-grown BiOSe nanoflakes at low temperatures. This value is comparable to what is observed in graphene grown by chemical vapour deposition and at the LaAlO-SrTiO interface, making the detection of Shubnikov-de Haas quantum oscillations possible. Top-gated field-effect transistors based on BiOSe crystals down to the bilayer limit exhibit high Hall mobility values (up to 450 cm V s), large current on/off ratios (>10) and near-ideal subthreshold swing values (∼65 mV dec) at room temperature. Our results make BiOSe a promising candidate for future high-speed and low-power electronic applications.

摘要

高迁移率半导体超薄膜构成了现代电子学的基础,并可能推动高性能器件的可扩展制造。由于传统半导体无法达到超薄极限,因此识别具有高载流子迁移率和大电子带隙的新型二维材料是基础研究的关键目标。然而,目前具有优异性能的空气稳定型超薄半导体材料仍然难以获得。在此,我们报告了通过化学气相沉积生长的非封装层状BiOSe超薄膜,其表现出优异的空气稳定性和高迁移率半导体行为。我们观察到带隙值约为0.8 eV,由于量子限制效应,该值强烈依赖于薄膜厚度。在低温下,在生长态的BiOSe纳米薄片中测得的超高霍尔迁移率值>20,000 cm V s。该值与通过化学气相沉积在LaAlO-SrTiO界面上生长的石墨烯中观察到的值相当,这使得检测舒布尼科夫-德哈斯量子振荡成为可能。基于BiOSe晶体直至双层极限的顶栅场效应晶体管在室温下表现出高霍尔迁移率值(高达450 cm V s)、大电流开/关比(>10)和接近理想的亚阈值摆幅值(约65 mV dec)。我们的结果使BiOSe成为未来高速和低功耗电子应用的有前途的候选材料。

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