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碳化硅外延石墨烯中的化学掺杂诱导的从石墨烯到“普通金属”的转变

Chemical-doping-driven crossover from graphene to "ordinary metal" in epitaxial graphene grown on SiC.

机构信息

National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA.

出版信息

Nanoscale. 2017 Aug 17;9(32):11537-11544. doi: 10.1039/c7nr04155a.

DOI:10.1039/c7nr04155a
PMID:28767112
Abstract

Atmospheric chemical doping can be used to modify the electronic properties of graphene. Here we report that the chemical atmospheric doping (derived from air, oxygen and water vapor) of low-carrier-density monolayer epitaxial graphene on SiC can be readily tuned by a simple low-temperature (T ≤ 450 K), in situ vacuum gentle heating method. Interestingly, such an approach allows, for the first time, the observation of a crossover from graphene (μ/μ ≈ 2) to an "ordinary metal" (μ/μ ≈ 1) with decreasing carrier density, where μ and μ are transport mobility and quantum mobility, respectively. In the low carrier density limit, our results are consistent with the theoretical prediction that μ is inversely proportional to charged impurity density. Our data also suggest that atmospheric chemical doping can be used to vary intervalley scattering in graphene which plays a crucial role in backward scattering events.

摘要

大气化学掺杂可用于修饰石墨烯的电子性质。在这里,我们报告了通过简单的低温(T≤450 K)、原位真空温和加热方法,可以很容易地调节 SiC 上低载流子密度单层外延石墨烯的化学大气掺杂(源自空气、氧气和水蒸气)。有趣的是,这种方法首次允许观察到从石墨烯(μ/μ≈2)到“普通金属”(μ/μ≈1)的转变,载流子密度降低,其中μ和μ分别是迁移率和量子迁移率。在低载流子密度极限下,我们的结果与理论预测一致,即μ与带电杂质密度成反比。我们的数据还表明,大气化学掺杂可用于改变石墨烯中的谷间散射,这在反向散射事件中起着至关重要的作用。

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