Keshavarz Hedayati Mehdi, Elbahri Mady
Nanochemistry and Nanoengineering, Institute for Materials Science, Faculty of Engineering, Christian-Albrechts-Universität zu Kiel, Kiel 24143, Germany.
Nanochemistry and Nanoengineering, Helmholtz-Zentrum Geesthacht, Geesthacht 21502, Germany.
Materials (Basel). 2016 Jun 21;9(6):497. doi: 10.3390/ma9060497.
Reduction of unwanted light reflection from a surface of a substance is very essential for improvement of the performance of optical and photonic devices. Antireflective coatings (ARCs) made of single or stacking layers of dielectrics, nano/microstructures or a mixture of both are the conventional design geometry for suppression of reflection. Recent progress in theoretical nanophotonics and nanofabrication has enabled more flexibility in design and fabrication of miniaturized coatings which has in turn advanced the field of ARCs considerably. In particular, the emergence of plasmonic and metasurfaces allows for the realization of broadband and angular-insensitive ARC coatings at an order of magnitude thinner than the operational wavelengths. In this review, a short overview of the development of ARCs, with particular attention paid to the state-of-the-art plasmonic- and metasurface-based antireflective surfaces, is presented.
减少物质表面不必要的光反射对于提高光学和光子器件的性能至关重要。由单层或多层电介质、纳米/微结构或两者混合制成的抗反射涂层（ARC）是抑制反射的传统设计几何结构。理论纳米光子学和纳米制造的最新进展使得在设计和制造小型化涂层方面具有更大的灵活性，这反过来又极大地推动了ARC领域的发展。特别是，等离子体和超表面的出现使得能够实现比工作波长薄一个数量级的宽带和角度不敏感ARC涂层。在这篇综述中，简要概述了ARC的发展，特别关注了基于最新等离子体和超表面的抗反射表面。
