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通过拉曼光谱映射对氧化石墨烯还原过程的统计分析。

Statistical analysis of the reduction process of graphene oxide probed by Raman spectroscopy mapping.

作者信息

Wróblewska A, Dużyńska A, Judek J, Stobiński L, Żerańska K, Gertych A P, Zdrojek M

机构信息

Faculty of Physics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland.

出版信息

J Phys Condens Matter. 2017 Nov 29;29(47):475201. doi: 10.1088/1361-648X/aa92fe.

Abstract

We propose a method for monitoring the large-scale homogeneity of the reduction process of graphene oxide. For this purpose, a Raman mapping technique is employed to probe the evolution of the phonon properties of two different graphene oxide (GO) thin films upon controllable thermal reduction. The reduction of GO is reflected by the upshift of the statistical distribution of the relative intensity ratio of the G and D peaks (I /I ) of the Raman spectra and is consistent with the ratio obtained for chemically reduced GO. In addition, the shifts of the position distributions of the main Raman modes ([Formula: see text], [Formula: see text]) and their cross-correlation with the I /I ratio provides evidence of a change of the doping level, demonstrating the influence of reduction processes on GO films.

摘要

我们提出了一种监测氧化石墨烯还原过程大规模均匀性的方法。为此,采用拉曼映射技术来探测两种不同氧化石墨烯(GO)薄膜在可控热还原过程中声子特性的演变。GO的还原通过拉曼光谱中G峰和D峰相对强度比(I /I )统计分布的上移来反映,并且与化学还原GO所得到的比值一致。此外,主要拉曼模式([公式:见原文],[公式:见原文])位置分布的移动及其与I /I 比值的互相关性提供了掺杂水平变化的证据,证明了还原过程对GO薄膜的影响。

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