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通过将石墨烯掺入 ZnO 纳米粒子来抑制 PbS 量子点光伏器件的界面电荷复合。

Suppressed Interfacial Charge Recombination of PbS Quantum Dot Photovoltaics by Graphene Incorporated into ZnO Nanoparticles.

机构信息

Research Institute for Natural Sciences and Department of Chemistry , Hanyang University , Seoul 133-791 , Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2018 Aug 1;10(30):25311-25320. doi: 10.1021/acsami.8b05556. Epub 2018 Jul 20.

DOI:10.1021/acsami.8b05556
PMID:29863331
Abstract

Single-layer graphene (SLG) was incorporated into ZnO nanoparticles (NPs), and use of this material in photovoltaic devices generated significant changes. The Fermi level of ZnO NPs underwent a downshift, whereas the conduction and valence bands were maintained with increasing SLG concentrations. Furthermore, the effective defect densities were reduced and carrier mobility was enhanced. Colloidal quantum dot photovoltaics (CQDPVs) with the SLG-incorporated ZnO NP layer as an electron transporting layer achieved significant performance enhancement. Poor performing CQDPVs were also observed with incorporation of an excess amount of SLG. This trend paralleled the interfacial charge recombination trends of CQDPVs. Effective suppression of interfacial recombination was achieved for CQDPVs with an appropriate SLG concentration, whereas dramatically increased interfacial recombination was observed for CQDPVs with an excess of SLG. For CQDPVs with appropriate SLG incorporation, efficient defect passivation and enhanced electron mobility of ZnO NPs facilitated loss-less electron transfer and efficient electron extraction without compromising the favorable energy level alignment. Excess SLG incorporation led to an increase in recombination within the PbS QD layer due to the presence of an energy barrier. This simple and powerful strategy provides an effective method for modulating the interfacial properties of CQDPVs.

摘要

单层石墨烯(SLG)被掺入到氧化锌纳米粒子(NPs)中,并且在光伏器件中使用这种材料会产生显著的变化。氧化锌 NPs 的费米能级向下移动,而导带和价带在增加 SLG 浓度时保持不变。此外,有效缺陷密度降低,载流子迁移率提高。具有掺入 SLG 的 ZnO NP 层作为电子传输层的胶体量子点光伏器件(CQDPVs)实现了显著的性能增强。然而,掺入过量 SLG 也会导致 CQDPVs 性能下降。这种趋势与 CQDPVs 的界面电荷复合趋势相吻合。对于具有适当 SLG 浓度的 CQDPVs,可以有效抑制界面复合,而对于过量 SLG 的 CQDPVs,则观察到界面复合急剧增加。对于具有适当 SLG 掺入的 CQDPVs,氧化锌 NPs 的有效缺陷钝化和电子迁移率增强促进了无损耗的电子转移和有效的电子提取,而不会影响有利的能级对准。过量 SLG 的掺入会由于存在能垒而导致 PbS QD 层内的复合增加。这种简单而强大的策略为调节 CQDPVs 的界面性质提供了一种有效的方法。

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