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在锑化铟(111)B 上揭示并形成了晶体相和氧化物相。

Crystalline and oxide phases revealed and formed on InSb(111)B.

作者信息

Mäkelä Jaakko, Jahanshah Rad Zahra Sadat, Lehtiö Juha-Pekka, Kuzmin Mikhail, Punkkinen Marko P J, Laukkanen Pekka, Kokko Kalevi

机构信息

University of Turku, Department of Physics and Astronomy, FI-20014, Turku, Finland.

Comptek Solutions Ltd., Voimakatu 14, FI-20520, Turku, Finland.

出版信息

Sci Rep. 2018 Sep 26;8(1):14382. doi: 10.1038/s41598-018-32723-5.

Abstract

Oxidation treatment creating a well-ordered crystalline structure has been shown to provide a major improvement for III-V semiconductor/oxide interfaces in electronics. We present this treatment's effects on InSb(111)B surface and its electronic properties with scanning tunneling microscopy and spectroscopy. Possibility to oxidize (111)B surface with parameters similar to the ones used for (100) surface is found, indicating a generality of the crystalline oxidation among different crystal planes, crucial for utilization in nanotechnology. The outcome is strongly dependent on surface conditions and remarkably, the (111) plane can oxidize without changes in surface lattice symmetry, or alternatively, resulting in a complex, semicommensurate quasicrystal-like structure. The findings are of major significance for passivation via oxide termination for nano-structured III-V/oxide devices containing several crystal plane surfaces. As a proof-of-principle, we present a procedure where InSb(111)B surface is cleaned by simple HCl-etching, transferred via air, and post-annealed and oxidized in ultrahigh vacuum.

摘要

已证明,形成有序晶体结构的氧化处理能显著改善电子器件中III-V族半导体/氧化物界面的性能。我们用扫描隧道显微镜和光谱学展示了这种处理对InSb(111)B表面及其电子特性的影响。研究发现,用与(100)表面类似的参数氧化(111)B表面是可行的,这表明不同晶面的晶体氧化具有普遍性,这对于纳米技术的应用至关重要。结果强烈依赖于表面条件,值得注意的是,(111)面可以在不改变表面晶格对称性的情况下氧化,或者形成一种复杂的、半共格的准晶状结构。这些发现对于含有多个晶面的纳米结构III-V/氧化物器件通过氧化物终止进行钝化具有重要意义。作为原理验证,我们展示了一个过程,即通过简单的HCl蚀刻清洁InSb(111)B表面,通过空气转移,然后在超高真空下进行后退火和氧化。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/39d0/6158213/ed28c661eb94/41598_2018_32723_Fig1_HTML.jpg

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