Majhi A, Nayak Maheswar, Pradhan P C, Filatova E O, Sokolov A, Schäfers F
Synchrotrons Utilization Section, Raja Ramanna Centre for Advanced Technology, Indore, 452013, India.
Homi Bhabha National Institute, Training School Complex, Anushakti Nagar, Mumbai, 400094, India.
Sci Rep. 2018 Oct 24;8(1):15724. doi: 10.1038/s41598-018-34076-5.
We introduce a novel approach that addresses the probing of interfacial structural phenomena in layered nano-structured films. The approach combines resonant soft x-ray reflection spectroscopy at grazing incidence near the "critical angle" with angular dependent reflection at energies around the respective absorption edges. Dynamic scattering is considered to determine the effective electron density and hence chemically resolved atomic profile across the structure based on simultaneous data analysis. We demonstrate application of the developed technique on the layered model structure C (20 Å)/B (40 Å)/Si (300 Å)/W (10 Å)/substrate. We precisely quantify atomic migration across the interfaces, a few percent of chemical changes of materials and the presence of impurities from top to the buried interfaces. The results obtained reveal the sensitivity of the approach towards resolving the compositional differences up to a few atomic percent. The developed approach enables the reconstruction of a highly spatio-chemically resolved interfacial map of complex nano-scaled interfaces with technical relevance to many emerging applied research fields.
我们介绍了一种新颖的方法，用于研究层状纳米结构薄膜中的界面结构现象。该方法将掠入射近“临界角”处的共振软X射线反射光谱与各吸收边能量附近的角度相关反射相结合。基于同时进行的数据分析，考虑动态散射来确定有效电子密度，从而确定整个结构的化学分辨原子分布。我们展示了所开发技术在层状模型结构C（20 Å）/B（40 Å）/Si（300 Å）/W（10 Å）/衬底上的应用。我们精确量化了跨界面的原子迁移、材料百分之几的化学变化以及从顶部到掩埋界面的杂质存在情况。所获得的结果揭示了该方法在分辨高达几个原子百分比的成分差异方面的灵敏度。所开发的方法能够重建复杂纳米尺度界面的高度空间化学分辨界面图，这与许多新兴应用研究领域具有技术相关性。
