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通过简单溶胶-凝胶法在SrTiO₃(111)衬底上外延生长正交晶系GaFeO₃薄膜。

Epitaxial Growth of Orthorhombic GaFeO₃ Thin Films on SrTiO₃ (111) Substrates by Simple Sol-Gel Method.

作者信息

Zhang Minghui, Yasui Shintaro, Katayama Tsukasa, Rao Badari Narayana, Wen Haiqin, Pan Xiuhong, Tang Meibo, Ai Fei, Itoh Mitsuru

机构信息

State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China.

Laboratory for Materials and Structures, Tokyo Institute of Technology, Midori-ku, Yokohama 226-8503, Japan.

出版信息

Materials (Basel). 2019 Jan 14;12(2):254. doi: 10.3390/ma12020254.

DOI:10.3390/ma12020254
PMID:30646559
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6356229/
Abstract

A Sol-gel method assisted with spin-coating has been successfully used to grow orthorhombic GaFeO₃ epitaxial films on SrTiO₃ (111) substrates for the first time. The film with crystal structure has been grown along the c-axis. The rocking curve of (004) reflection shows that the Full-Width at Half-Maximum (FWHM) value could be determined to be 0.230°, indicating good single crystallinity and high quality. X-ray Φ scan reveals a three-fold symmetry of the substrate and a six-fold symmetry of the film, respectively. The in-plane domains rotate 60° from each other in the film. Uniform film with dense structure, columnar grains with similar grain size was obtained. The thickness of the film was evaluated to be ~170 nm. The roughness value (RMS) measured by AFM was 4.5 nm, revealing a flat film. The in-plane Magnetization versus Magnetic field () curve at 5 K performs a typical ferri- or ferromagnetic hysteresis loop with a saturated magnetization () value of 136 emu/cm³. The Curie temperature could be determined to be 174 K. Compared to Pulsed Laser Deposition (PLD), the sol-gel method can prepare large area films with low cost. These new films show promising applications in multiferroic devices.

摘要

一种采用旋涂辅助的溶胶-凝胶法首次成功地在SrTiO₃(111)衬底上生长出正交晶系的GaFeO₃外延薄膜。具有晶体结构的薄膜沿c轴生长。(004)反射的摇摆曲线表明,半高宽(FWHM)值可确定为0.230°,这表明其具有良好的单晶性和高质量。X射线Φ扫描分别揭示了衬底的三重对称性和薄膜的六重对称性。薄膜中的面内畴彼此旋转60°。获得了具有致密结构、柱状晶粒且晶粒尺寸相似的均匀薄膜。薄膜厚度估计约为170 nm。原子力显微镜(AFM)测量的粗糙度值(RMS)为4.5 nm,表明薄膜表面平整。5 K时的面内磁化强度与磁场()曲线呈现典型的亚铁磁或铁磁滞回线,饱和磁化强度()值为136 emu/cm³。居里温度可确定为174 K。与脉冲激光沉积(PLD)相比,溶胶-凝胶法能够以低成本制备大面积薄膜。这些新型薄膜在多铁性器件中显示出广阔的应用前景。

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