Suppr超能文献

具有InAs/Si异质结和源极口袋结构的双栅隧道场效应晶体管的漏极电流模型

Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture.

作者信息

Lu Hongliang, Lu Bin, Zhang Yuming, Zhang Yimen, Lv Zhijun

机构信息

Key Laboratory of Wide Band-Gap Semiconductor technology, School of Microelectronics, Xidian University, Xi'an 710071, China.

出版信息

Nanomaterials (Basel). 2019 Feb 1;9(2):181. doi: 10.3390/nano9020181.

Abstract

The practical use of tunnel field-effect transistors is retarded by the low on-state current. In this paper, the energy-band engineering of InAs/Si heterojunction and novel device structure of source-pocket concept are combined in a single tunnel field-effect transistor to extensively boost the device performance. The proposed device shows improved tunnel on-state current and subthreshold swing. In addition, analytical potential model for the proposed device is developed and tunneling current is also calculated. Good agreement of the modeled results with numerical simulations verifies the validation of our model. With significantly reduced simulation time while acceptable accuracy, the model would be helpful for the further investigation of TFET-based circuit simulations.

摘要

隧道场效应晶体管的实际应用因导通电流低而受到阻碍。本文将InAs/Si异质结的能带工程与源极口袋概念的新型器件结构相结合,应用于单个隧道场效应晶体管中,以大幅提升器件性能。所提出的器件展现出改善的隧道导通电流和亚阈值摆幅。此外,还开发了该器件的解析势模型并计算了隧穿电流。模型结果与数值模拟结果的良好一致性验证了我们模型的有效性。该模型在精度可接受的同时显著减少了模拟时间,将有助于进一步开展基于隧道场效应晶体管的电路模拟研究。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d3ea/6410157/e2e1b09d9f07/nanomaterials-09-00181-g001.jpg

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验