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迈向超洁净石墨烯。

Towards super-clean graphene.

作者信息

Lin Li, Zhang Jincan, Su Haisheng, Li Jiayu, Sun Luzhao, Wang Zihao, Xu Fan, Liu Chang, Lopatin Sergei, Zhu Yihan, Jia Kaicheng, Chen Shulin, Rui Dingran, Sun Jingyu, Xue Ruiwen, Gao Peng, Kang Ning, Han Yu, Xu H Q, Cao Yang, Novoselov K S, Tian Zhongqun, Ren Bin, Peng Hailin, Liu Zhongfan

机构信息

Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.

Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, China.

出版信息

Nat Commun. 2019 Apr 23;10(1):1912. doi: 10.1038/s41467-019-09565-4.

DOI:
10.1038/s41467-019-09565-4
PMID:31015405
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6478734/
Abstract

Impurities produced during the synthesis process of a material pose detrimental impacts upon the intrinsic properties and device performances of the as-obtained product. This effect is especially pronounced in graphene, where surface contamination has long been a critical, unresolved issue, given graphene's two-dimensionality. Here we report the origins of surface contamination of graphene, which is primarily rooted in chemical vapour deposition production at elevated temperatures, rather than during transfer and storage. In turn, we demonstrate a design of Cu substrate architecture towards the scalable production of super-clean graphene (>99% clean regions). The readily available, super-clean graphene sheets contribute to an enhancement in the optical transparency and thermal conductivity, an exceptionally lower-level of electrical contact resistance and intrinsically hydrophilic nature. This work not only opens up frontiers for graphene growth but also provides exciting opportunities for the utilization of as-obtained super-clean graphene films for advanced applications.

摘要

材料合成过程中产生的杂质会对所得产品的固有特性和器件性能产生不利影响。这种影响在石墨烯中尤为明显,由于石墨烯的二维特性,表面污染长期以来一直是一个关键的、尚未解决的问题。在此,我们报告了石墨烯表面污染的根源,其主要源于高温下的化学气相沉积生产过程,而非转移和存储过程。相应地,我们展示了一种铜衬底结构的设计,用于可扩展地生产超清洁石墨烯(清洁区域>99%)。这种易于获得的超清洁石墨烯片有助于提高光学透明度和热导率,显著降低电接触电阻,并具有固有的亲水性。这项工作不仅为石墨烯的生长开辟了新领域,还为将所得超清洁石墨烯薄膜用于先进应用提供了令人兴奋的机会。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/c1ca00750d28/41467_2019_9565_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/d590f72ea421/41467_2019_9565_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/d5cbc7d9b14e/41467_2019_9565_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/0164a3e17548/41467_2019_9565_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/c1ca00750d28/41467_2019_9565_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/d590f72ea421/41467_2019_9565_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/d5cbc7d9b14e/41467_2019_9565_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/0164a3e17548/41467_2019_9565_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/150c/6478734/c1ca00750d28/41467_2019_9565_Fig4_HTML.jpg

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