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用于等离子体传感的准一维金纳米带的可扩展制造。

Scalable Fabrication of Quasi-One-Dimensional Gold Nanoribbons for Plasmonic Sensing.

机构信息

Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States.

California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States.

出版信息

Nano Lett. 2020 Mar 11;20(3):1747-1754. doi: 10.1021/acs.nanolett.9b04963. Epub 2020 Feb 13.

Abstract

Plasmonic nanostructures have a wide range of applications, including chemical and biological sensing. However, the development of techniques to fabricate submicrometer-sized plasmonic structures over large scales remains challenging. We demonstrate a high-throughput, cost-effective approach to fabricate Au nanoribbons via chemical lift-off lithography (CLL). Commercial HD-DVDs were used as large-area templates for CLL. Transparent glass slides were coated with Au/Ti films and functionalized with self-assembled alkanethiolate monolayers. Monolayers were patterned with lines via CLL. The lifted-off, exposed regions of underlying Au were selectively etched into large-area grating-like patterns (200 nm line width; 400 nm pitch; 60 nm height). After removal of the remaining monolayers, a thin InO layer was deposited and the resulting gratings were used as plasmonic sensors. Distinct features in the extinction spectra varied in their responses to refractive index changes in the solution environment with a maximum bulk sensitivity of ∼510 nm/refractive index unit. Sensitivity to local refractive index changes in the near-field was also achieved, as evidenced by real-time tracking of lipid vesicle or protein adsorption. These findings show how CLL provides a simple and economical means to pattern large-area plasmonic nanostructures for applications in optoelectronics and sensing.

摘要

等离子体纳米结构具有广泛的应用,包括化学和生物传感。然而,开发制造亚微米级等离子体结构的技术仍然具有挑战性。我们展示了一种通过化学剥离光刻(CLL)制造 Au 纳米带的高通量、经济有效的方法。商用 HD-DVD 被用作 CLL 的大面积模板。透明玻璃片涂有 Au/Ti 薄膜,并通过自组装烷硫醇单层进行功能化。通过 CLL 对单层进行图案化处理。将下面的 Au 暴露区域选择性地刻蚀成大面积光栅状图案(200nm 线宽;400nm 间距;60nm 高度)。去除剩余的单层后,沉积一层薄薄的 InO 层,所得光栅用作等离子体传感器。在溶液环境中,消光谱中的特征性变化对折射率变化的响应不同,最大体灵敏度约为 510nm/折射率单位。通过实时跟踪脂质囊泡或蛋白质吸附,也实现了对近场局部折射率变化的敏感性。这些发现表明 CLL 如何为大面积等离子体纳米结构的图案化提供了一种简单而经济的方法,可应用于光电学和传感领域。

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本文引用的文献

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