• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

用于制造硬X射线钯/硅波带片的金属辅助化学蚀刻和化学镀

Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates.

作者信息

Akan Rabia, Frisk Thomas, Lundberg Fabian, Ohlin Hanna, Johansson Ulf, Li Kenan, Sakdinawat Anne, Vogt Ulrich

机构信息

KTH Royal Institute of Technology, Department of Applied Physics, Biomedical and X-ray Physics, Albanova University Center, 106 91 Stockholm, Sweden.

MAX IV Laboratory, Lund University, 22 100 Lund, Sweden.

出版信息

Micromachines (Basel). 2020 Mar 13;11(3):301. doi: 10.3390/mi11030301.

DOI:10.3390/mi11030301
PMID:32183040
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7143916/
Abstract

Zone plates are diffractive optics commonly used in X-ray microscopes. Here, we present a wet-chemical approach for fabricating high aspect ratio Pd/Si zone plate optics aimed at the hard X-ray regime. A Si zone plate mold is fabricated via metal-assisted chemical etching (MACE) and further metalized with Pd via electroless deposition (ELD). MACE results in vertical Si zones with high aspect ratios. The observed MACE rate with our zone plate design is 700 nm/min. The ELD metallization yields a Pd density of 10.7 g/cm 3 , a value slightly lower than the theoretical density of 12 g/cm 3 . Fabricated zone plates have a grid design, 1:1 line-to-space-ratio, 30 nm outermost zone width, and an aspect ratio of 30:1. At 9 keV X-ray energy, the zone plate device shows a first order diffraction efficiency of 1.9%, measured at the MAX IV NanoMAX beamline. With this work, the possibility is opened to fabricate X-ray zone plates with low-cost etching and metallization methods.

摘要

波带片是X射线显微镜中常用的衍射光学元件。在此,我们提出一种湿化学方法来制造针对硬X射线区域的高纵横比钯/硅波带片光学元件。通过金属辅助化学蚀刻(MACE)制造硅波带片模具,并通过化学镀(ELD)进一步用钯金属化。MACE可形成具有高纵横比的垂直硅区。采用我们的波带片设计观察到的MACE速率为700纳米/分钟。ELD金属化产生的钯密度为10.7克/立方厘米,该值略低于理论密度12克/立方厘米。制造的波带片具有网格设计、1:1的线宽与间距比、30纳米的最外层区宽度以及30:1的纵横比。在9千电子伏特的X射线能量下,该波带片装置在MAX IV NanoMAX光束线上测得的一阶衍射效率为1.9%。通过这项工作,开启了用低成本蚀刻和金属化方法制造X射线波带片的可能性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/f9151257d0b2/micromachines-11-00301-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/6321a9307366/micromachines-11-00301-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/f7cdac822324/micromachines-11-00301-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/c102bf149f71/micromachines-11-00301-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/589ccac88ef0/micromachines-11-00301-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/f9151257d0b2/micromachines-11-00301-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/6321a9307366/micromachines-11-00301-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/f7cdac822324/micromachines-11-00301-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/c102bf149f71/micromachines-11-00301-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/589ccac88ef0/micromachines-11-00301-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/77e9/7143916/f9151257d0b2/micromachines-11-00301-g005.jpg

相似文献

1
Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates.用于制造硬X射线钯/硅波带片的金属辅助化学蚀刻和化学镀
Micromachines (Basel). 2020 Mar 13;11(3):301. doi: 10.3390/mi11030301.
2
Tunable hard x-ray nanofocusing with Fresnel zone plates fabricated using deep etching.利用深度蚀刻制造的菲涅耳波带片实现可调谐硬X射线纳米聚焦。
Optica. 2020 May;7(5):410-416. doi: 10.1364/OPTICA.387445.
3
Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures.用于深硅纳米结构的金属辅助化学蚀刻的优化
Nanomaterials (Basel). 2021 Oct 22;11(11):2806. doi: 10.3390/nano11112806.
4
Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics.用于硬 X 射线衍射光学器件的超高纵横比高分辨率纳米制造。
Nat Commun. 2014 Jun 27;5:4243. doi: 10.1038/ncomms5243.
5
Fabrication of x-ray zone plates by surface-plasma chemical vapor deposition.通过表面等离子体化学气相沉积法制造X射线波带片
Appl Opt. 2007 Aug 10;46(23):5964-6. doi: 10.1364/ao.46.005964.
6
Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling.利用原子层沉积和聚焦离子束铣削技术制备的多层菲涅尔波带片实现 8keV X 射线的高效聚焦。
J Synchrotron Radiat. 2013 May;20(Pt 3):433-40. doi: 10.1107/S0909049513006602. Epub 2013 Apr 9.
7
Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures.用于硅基波带片纳米结构的金属辅助化学蚀刻的反应控制
RSC Adv. 2018 Apr 3;8(23):12628-12634. doi: 10.1039/c8ra01627e.
8
Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review.金属辅助化学蚀刻法制备X射线光学元件综述
Micromachines (Basel). 2020 Jun 12;11(6):589. doi: 10.3390/mi11060589.
9
High resolution double-sided diffractive optics for hard X-ray microscopy.用于硬X射线显微镜的高分辨率双面衍射光学器件。
Opt Express. 2015 Jan 26;23(2):776-86. doi: 10.1364/OE.23.000776.
10
3D Nanofabrication of High-Resolution Multilayer Fresnel Zone Plates.高分辨率多层菲涅耳波带片的3D纳米制造
Adv Sci (Weinh). 2018 Jun 5;5(9):1800346. doi: 10.1002/advs.201800346. eCollection 2018 Sep.

引用本文的文献

1
Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns.用于密集纳米结构图案的CSAR62单层剥离
Micromachines (Basel). 2023 Mar 29;14(4):766. doi: 10.3390/mi14040766.
2
Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures.用于深硅纳米结构的金属辅助化学蚀刻的优化
Nanomaterials (Basel). 2021 Oct 22;11(11):2806. doi: 10.3390/nano11112806.
3
NanoMAX: the hard X-ray nanoprobe beamline at the MAX IV Laboratory.纳米MAX:马克斯·IV实验室的硬X射线纳米探针光束线。

本文引用的文献

1
Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures.用于硅基波带片纳米结构的金属辅助化学蚀刻的反应控制
RSC Adv. 2018 Apr 3;8(23):12628-12634. doi: 10.1039/c8ra01627e.
2
Fresnel zone plate stacking in the intermediate field for high efficiency focusing in the hard X-ray regime.用于硬X射线波段中间场高效聚焦的菲涅耳波带片堆叠
Opt Express. 2014 Nov 17;22(23):28142-53. doi: 10.1364/OE.22.028142.
3
Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics.
J Synchrotron Radiat. 2021 Nov 1;28(Pt 6):1935-1947. doi: 10.1107/S1600577521008213. Epub 2021 Oct 5.
4
Editorial for the Special Issue on Micro- and Nano-Fabrication by Metal Assisted Chemical Etching.金属辅助化学蚀刻微纳加工特刊社论
Micromachines (Basel). 2020 Oct 31;11(11):988. doi: 10.3390/mi11110988.
5
Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review.金属辅助化学蚀刻法制备X射线光学元件综述
Micromachines (Basel). 2020 Jun 12;11(6):589. doi: 10.3390/mi11060589.
6
Micromachining of High Quality PMN-31%PT Single Crystals for High-Frequency (>20 MHz) Ultrasonic Array Transducer Applications.用于高频(>20 MHz)超声阵列换能器应用的高质量PMN-31%PT单晶的微加工
Micromachines (Basel). 2020 May 19;11(5):512. doi: 10.3390/mi11050512.
用于硬 X 射线衍射光学器件的超高纵横比高分辨率纳米制造。
Nat Commun. 2014 Jun 27;5:4243. doi: 10.1038/ncomms5243.
4
The race to x-ray microbeam and nanobeam science.X 射线微束和纳米束科学的竞赛。
Science. 2011 Dec 2;334(6060):1234-9. doi: 10.1126/science.1202366.
5
Metal-assisted chemical etching of silicon: a review.金属辅助化学刻蚀硅:综述。
Adv Mater. 2011 Jan 11;23(2):285-308. doi: 10.1002/adma.201001784.
6
Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography.通过 100keV 电子束光刻技术制备高密度高纵横比氢倍半硅氧烷纳米结构。
Nanotechnology. 2010 Jul 16;21(28):285305. doi: 10.1088/0957-4484/21/28/285305. Epub 2010 Jun 18.
7
Advanced thin film technology for ultrahigh resolution X-ray microscopy.用于超高分辨率X射线显微镜的先进薄膜技术。
Ultramicroscopy. 2009 Oct;109(11):1360-4. doi: 10.1016/j.ultramic.2009.07.005. Epub 2009 Jul 15.