Xu Qiulei, Li Xinyu, Lin Qingli, Shen Huaibin, Wang Hongzhe, Du Zuliang
Key Lab for Special Functional Materials, Ministry of Education, National and Local Joint Engineering Research Center for High-Efficiency Display and Lighting Technology, Collaborative Innovation Center of Nano Functional Materials and Applications, School of Materials Science and Engineering, Henan University, Kaifeng, China.
Front Chem. 2020 Apr 23;8:265. doi: 10.3389/fchem.2020.00265. eCollection 2020.
As the charge transport layer of quantum dot (QD) light-emitting diodes (QLEDs), metal oxides are expected to be more stable compared with organic materials. However, the efficiency of metal oxide-based all-inorganic QLEDs is still far behind that of organic-inorganic hybrid ones. The main reason is the strong interaction between metal oxide and QDs leading to the emission quenching of QDs. Here, we demonstrated nickel oxide (NiO)-based all-inorganic QLEDs with a maximum current efficiency of 20.4 cd A and external quantum efficiency (EQE) of 5.5%, which is among the most efficient all-inorganic QLEDs. The high efficiency is mainly attributed to the aluminum oxide (AlO) deposited at the NiO/QDs interface to suppress the strong quenching effect of NiO on the QD emission, together with the molybdenum oxide (MoO) that reduced the leakage current and facilitated hole injection, more than 300% enhancement was achieved compared with the pristine NiO-based QLEDs. Our study confirmed the effect of decorating the NiO/QDs interface on the performance enhancement of the all-inorganic QLEDs.
作为量子点发光二极管(QLED)的电荷传输层,金属氧化物有望比有机材料更稳定。然而,基于金属氧化物的全无机QLED的效率仍远低于有机-无机混合QLED。主要原因是金属氧化物与量子点之间的强相互作用导致量子点的发光猝灭。在此,我们展示了基于氧化镍(NiO)的全无机QLED,其最大电流效率为20.4 cd/A,外量子效率(EQE)为5.5%,这是效率最高的全无机QLED之一。高效率主要归因于沉积在NiO/量子点界面的氧化铝(AlO)抑制了NiO对量子点发射的强猝灭效应,以及氧化钼(MoO)减少了漏电流并促进了空穴注入,与原始的基于NiO的QLED相比,实现了超过300%的增强。我们的研究证实了修饰NiO/量子点界面对全无机QLED性能增强的作用。