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利用深度突变扫描预测药物耐药性。

Predicting Drug Resistance Using Deep Mutational Scanning.

机构信息

Department of Entomology, Agricultural Research Organization, Volcani Center, P.O.B 15159, Rishon LeZion 7505101, Israel.

Department of Dermatology, Oregon Health & Science University, Baird Hall 3225 SW Pavilion Loop, Portland, OR 97239, USA.

出版信息

Molecules. 2020 May 11;25(9):2265. doi: 10.3390/molecules25092265.

Abstract

Drug resistance is a major healthcare challenge, resulting in a continuous need to develop new inhibitors. The development of these inhibitors requires an understanding of the mechanisms of resistance for a critical mass of occurrences. Recent genome editing technologies based on high-throughput DNA synthesis and sequencing may help to predict mutations resulting in resistance by testing large mutagenesis libraries. Here we describe the rationale of this approach, with examples and relevance to drug development and resistance in malaria.

摘要

耐药性是一个主要的医疗保健挑战,导致不断需要开发新的抑制剂。这些抑制剂的开发需要对大量发生的耐药机制有一定的了解。最近基于高通量 DNA 合成和测序的基因组编辑技术可能有助于通过测试大型诱变文库来预测导致耐药性的突变。在这里,我们描述了这种方法的基本原理,并举例说明了其与疟疾药物开发和耐药性的相关性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ce18/7248951/d709244f0743/molecules-25-02265-g001.jpg

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