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锂在铌钨氧化物剪切结构中的扩散

Lithium Diffusion in Niobium Tungsten Oxide Shear Structures.

作者信息

Koçer Can P, Griffith Kent J, Grey Clare P, Morris Andrew J

机构信息

Theory of Condensed Matter, Cavendish Laboratory, University of Cambridge, J. J. Thomson Avenue, Cambridge CB3 0HE, U.K.

Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States.

出版信息

Chem Mater. 2020 May 12;32(9):3980-3989. doi: 10.1021/acs.chemmater.0c00483. Epub 2020 Apr 26.

DOI:10.1021/acs.chemmater.0c00483
PMID:32421040
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7222352/
Abstract

Niobium tungsten oxides with crystallographic shear structures form a promising class of high-rate Li-ion anode materials. Lithium diffusion within these materials is studied in this work using density functional theory calculations, specifically nudged elastic band calculations and molecular dynamics simulations. Lithium diffusion is found to occur through jumps between 4-fold coordinated window sites with low activation barriers (80-300 meV) and is constrained to be effectively one-dimensional by the crystallographic shear planes of the structures. We identify a number of other processes, including rattling motions with barriers on the order of the thermal energy at room temperature, and intermediate barrier hops between 4-fold and 5-fold coordinated lithium sites. We demonstrate differences regarding diffusion pathways between different cavity types; within the ReO-like block units of the structures, cavities at the corners and edges host more isolated diffusion tunnels than those in the interior. Diffusion coefficients are found to be in the range of 10 to 10 m s for lithium concentrations of 0.5 Li/TM. Overall, the results provide a complete picture of the diffusion mechanism in niobium tungsten oxide shear structures, and the structure-property relationships identified in this work can be generalized to the entire family of crystallographic shear phases.

摘要

具有晶体学剪切结构的铌钨氧化物构成了一类很有前景的高倍率锂离子负极材料。在这项工作中,我们使用密度泛函理论计算,特别是推挤弹性带计算和分子动力学模拟,研究了这些材料中的锂扩散。发现锂通过在具有低活化能垒(80 - 300毫电子伏特)的4重配位窗口位点之间跳跃而发生扩散,并且受到结构的晶体学剪切面的限制,实际上是一维的。我们确定了许多其他过程,包括在室温下具有与热能相当的能垒的晃动运动,以及在4重和5重配位锂位点之间的中间能垒跳跃。我们展示了不同空腔类型之间扩散途径的差异;在结构的类ReO块状单元内,角落和边缘处的空腔比内部的空腔拥有更多孤立的扩散通道。对于0.5 Li/TM的锂浓度,扩散系数在10 到10 m s的范围内。总体而言,这些结果提供了铌钨氧化物剪切结构中扩散机制的完整图景,并且这项工作中确定的结构 - 性能关系可以推广到整个晶体学剪切相家族。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/44312edc1aca/cm0c00483_0009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/e6b92756d6ab/cm0c00483_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/92fbc8bcd245/cm0c00483_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/a90d114b3051/cm0c00483_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/fde5f3fbf46c/cm0c00483_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/241fed4ac18b/cm0c00483_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/44312edc1aca/cm0c00483_0009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/e6b92756d6ab/cm0c00483_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/92fbc8bcd245/cm0c00483_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/a90d114b3051/cm0c00483_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/fde5f3fbf46c/cm0c00483_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/241fed4ac18b/cm0c00483_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b96a/7222352/44312edc1aca/cm0c00483_0009.jpg

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