Huang Zhujun, Alharbi Abdullah, Mayer William, Cuniberto Edoardo, Taniguchi Takashi, Watanabe Kenji, Shabani Javad, Shahrjerdi Davood
Electrical and Computer Engineering, New York University, Brooklyn, NY, 11201, USA.
King Abdulaziz City for Science and Technology, Riyadh, 11442, Saudi Arabia.
Nat Commun. 2020 Jun 15;11(1):3029. doi: 10.1038/s41467-020-16817-1.
The proliferation of van der Waals (vdW) heterostructures formed by stacking layered materials can accelerate scientific and technological advances. Here, we report a strategy for constructing vdW heterostructures through the interface engineering of the exfoliation substrate using a sub-5 nm polymeric film. Our construction method has two main features that distinguish it from existing techniques. First is the consistency of its exfoliation process in increasing the yield and in producing large (>10,000 μm) monolayer graphene. Second is the applicability of its layer transfer process to different layered materials without requiring a specialized stamp-a feature useful for generalizing the assembly process. We demonstrate vdW graphene devices with peak carrier mobility of 200,000 and 800,000 cm V s at room temperature and 9 K, respectively. The simplicity of our construction method and its versatility to different layered materials may open doors for automating the fabrication process of vdW heterostructures.
通过堆叠层状材料形成的范德华（vdW）异质结构的激增可以加速科技进步。在此，我们报告了一种使用亚5纳米聚合物薄膜通过剥离衬底的界面工程构建vdW异质结构的策略。我们的构建方法有两个主要特征使其有别于现有技术。首先是其在提高产量和生产大面积（>10,000μm）单层石墨烯方面剥离过程的一致性。其次是其层转移过程适用于不同的层状材料，而无需专门的印章——这一特性有助于推广组装过程。我们展示了在室温下峰值载流子迁移率为200,000 cm² V⁻¹ s⁻¹、在9 K时为800,000 cm² V⁻¹ s⁻¹的vdW石墨烯器件。我们构建方法的简单性及其对不同层状材料的通用性可能为vdW异质结构的自动化制造过程打开大门。
