Ocier Christian R, Richards Corey A, Bacon-Brown Daniel A, Ding Qing, Kumar Raman, Garcia Tanner J, van de Groep Jorik, Song Jung-Hwan, Cyphersmith Austin J, Rhode Andrew, Perry Andrea N, Littlefield Alexander J, Zhu Jinlong, Xie Dajie, Gao Haibo, Messinger Jonah F, Brongersma Mark L, Toussaint Kimani C, Goddard Lynford L, Braun Paul V
Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, IL, USA.
Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, USA.
Light Sci Appl. 2020 Dec 3;9(1):196. doi: 10.1038/s41377-020-00431-3.
Direct laser writing (DLW) has been shown to render 3D polymeric optical components, including lenses, beam expanders, and mirrors, with submicrometer precision. However, these printed structures are limited to the refractive index and dispersive properties of the photopolymer. Here, we present the subsurface controllable refractive index via beam exposure (SCRIBE) method, a lithographic approach that enables the tuning of the refractive index over a range of greater than 0.3 by performing DLW inside photoresist-filled nanoporous silicon and silica scaffolds. Adjusting the laser exposure during printing enables 3D submicron control of the polymer infilling and thus the refractive index and chromatic dispersion. Combining SCRIBE's unprecedented index range and 3D writing accuracy has realized the world's smallest (15 µm diameter) spherical Luneburg lens operating at visible wavelengths. SCRIBE's ability to tune the chromatic dispersion alongside the refractive index was leveraged to render achromatic doublets in a single printing step, eliminating the need for multiple photoresins and writing sequences. SCRIBE also has the potential to form multicomponent optics by cascading optical elements within a scaffold. As a demonstration, stacked focusing structures that generate photonic nanojets were fabricated inside porous silicon. Finally, an all-pass ring resonator was coupled to a subsurface 3D waveguide. The measured quality factor of 4600 at 1550 nm suggests the possibility of compact photonic systems with optical interconnects that traverse multiple planes. SCRIBE is uniquely suited for constructing such photonic integrated circuits due to its ability to integrate multiple optical components, including lenses and waveguides, without additional printed supports.
直接激光写入(DLW)已被证明能够以亚微米精度制造三维聚合物光学元件,包括透镜、扩束器和镜子。然而,这些打印结构受限于光聚合物的折射率和色散特性。在此,我们提出了一种通过光束曝光实现的表面下可控折射率(SCRIBE)方法,这是一种光刻方法,通过在填充光致抗蚀剂的纳米多孔硅和二氧化硅支架内进行直接激光写入,能够在大于0.3的范围内调节折射率。在打印过程中调整激光曝光量,可以对聚合物填充进行三维亚微米控制,从而实现对折射率和色散的控制。结合SCRIBE前所未有的折射率范围和三维写入精度,实现了世界上最小(直径15μm)的、在可见光波长下工作的球形伦伯格透镜。利用SCRIBE在调节折射率的同时调节色散的能力,在单个打印步骤中制造了消色差双合透镜,无需使用多种光致抗蚀剂和写入序列。SCRIBE还有可能通过在支架内级联光学元件来形成多组分光学器件。作为演示,在多孔硅内部制造了产生光子纳米射流的堆叠聚焦结构。最后,将一个全通环形谐振器耦合到一个表面下三维波导。在1550nm处测得的品质因数为4600,这表明有可能构建具有穿越多个平面的光学互连的紧凑型光子系统。由于SCRIBE能够集成包括透镜和波导在内的多个光学元件,而无需额外的打印支撑,因此它特别适合构建此类光子集成电路。