Zhang Kun, Feng Shuanglong, Kang Shuai, Wu Yutong, Zhang Miaomiao, Wang Qingshan, Tao Zhiyong, Fan Yaxian, Lu Wenqiang
Key Laboratory of In-Fiber Integrated Optics, Ministry Education of China, Harbin Engineering University, Harbin, 150001, People's Republic of China. Chongqing Key Laboratory of Multi-Scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing, 400714, People's Republic of China.
Nanotechnology. 2021 Jan 13;32(14):145602. doi: 10.1088/1361-6528/abd57f.
A novel three-dimensional (3D) vertically-few-layer MoS (V-MoS) nanosheets- zero-dimensional PbS quantum dots (QDs) hybrid structure based broadband photodetector was fabricated, and its photoelectric performance was investigated in detail. We synthesized the V-MoS nanosheets by chemical vapor deposition, using the TiO layer as the induced layer, and proposed a possible growth mechanism. The use of the TiO induction layer successfully changed the growth direction of MoS from parallel to vertical. The prepared V-MoS nanosheets have a large specific surface area, abundantly exposed edges and excellent light absorption capacity. The V-MoS nanosheets detector was then fabricated and investigated, which exhibits a high sensitivity for 635 nm light, a fast response time and an excellent photoelectric response. The V-MoS nanosheets with a height of approximately 1 μm successfully broke the light absorption limit caused by the atomic thickness. Finally, we fabricated the PbS QDs/V-MoS nanosheets hybrid detector and demonstrated their potential for high-performance broadband photodetectors. The response wavelength of the hybrid detector extends from the visible band to the near-infrared band. The responsivity of the hybrid detector reaches 1.46 A W under 1450 nm illumination. The combination of 3D MoS nanosheets and QDs further improves the performance of MoS-based photodetector devices. We believe that the proposed zero-dimensional QDs and 3D vertical nanosheets hybrid structure broadband photodetector provides a promising way for the next-generation optoelectronic devices.
制备了一种基于新型三维(3D)垂直少层MoS(V-MoS)纳米片-零维PbS量子点(QDs)混合结构的宽带光电探测器,并详细研究了其光电性能。我们通过化学气相沉积法,以TiO层作为诱导层合成了V-MoS纳米片,并提出了一种可能的生长机制。TiO诱导层的使用成功地将MoS的生长方向从平行变为垂直。制备的V-MoS纳米片具有大的比表面积、大量暴露的边缘和优异的光吸收能力。然后制备并研究了V-MoS纳米片探测器,其对635nm光表现出高灵敏度、快速响应时间和优异的光电响应。高度约为1μm的V-MoS纳米片成功突破了由原子厚度引起的光吸收极限。最后,我们制备了PbS QDs/V-MoS纳米片混合探测器,并展示了它们在高性能宽带光电探测器方面的潜力。混合探测器的响应波长从可见光波段扩展到近红外波段。在1450nm光照下,混合探测器的响应度达到1.46A/W。3D MoS纳米片和量子点的结合进一步提高了基于MoS的光电探测器器件的性能。我们相信,所提出的零维量子点和3D垂直纳米片混合结构宽带光电探测器为下一代光电器件提供了一条有前景的途径。