Mballo Adama, Ahaitouf Ali, Sundaram Suresh, Srivastava Ashutosh, Ottapilakkal Vishnu, Gujrati Rajat, Vuong Phuong, Karrakchou Soufiane, Kumar Mritunjay, Li Xiaohang, Halfaya Yacine, Gautier Simon, Voss Paul L, Salvestrini Jean Paul, Ougazzaden Abdallah
CNRS, IRL 2958, GT-CNRS, 2 rue Marconi, 57070 Metz, France.
Georgia Tech-Lorraine, 2 rue Marconi, 57070 Metz, France.
ACS Omega. 2021 Dec 28;7(1):804-809. doi: 10.1021/acsomega.1c05458. eCollection 2022 Jan 11.
Metal-semiconductor-metal (MSM) detectors based on Ti/Au and Ni/Au interdigitated structures were fabricated using 2.5 micrometer thick hexagonal boron nitride (h-BN) layer with both natural and B-enriched boron. Current-voltage (-) and current-time (-) curves of the fabricated detectors were recorded with ( ) and without ( ) neutron irradiation, allowing the determination of their sensitivity ( ( )/ Δ ). Natural and B-enriched h-BN detectors exhibited high neutron sensitivities of 233 and 367% at 0 V bias under a flux of 3 × 10 n/cm/s, respectively. An imbalance in the distribution of filled traps between the two electric contacts could explain the self-biased operation of the MSM detectors. Neutron sensitivity is further enhanced with electrical biasing, reaching 316 and 1192% at 200 V and a flux of 3 × 10 n/cm/s for natural and B-enriched h-BN detectors, respectively, with dark current as low as 2.5 pA at 200 V. The increased performance under bias has been attributed to a gain mechanism based on neutron-induced charge carrier trapping at the semiconductor/metal interface. The response of the MSM detectors under thermal neutron flux and bias voltages was linear. These results clearly indicate that the thin-film monocrystal BN MSM neutron detectors can be optimized to operate sensitively with the absence of external bias and generate stronger signal detection using B-enriched boron.
基于Ti/Au和Ni/Au叉指结构的金属-半导体-金属(MSM)探测器是使用厚度为2.5微米的天然和富硼六方氮化硼(h-BN)层制造的。在有和没有中子辐照的情况下记录了所制造探测器的电流-电压(-)和电流-时间(-)曲线,从而确定其灵敏度(()/Δ)。在3×10 n/cm/s的通量下,天然和富硼h-BN探测器在0 V偏压下分别表现出233%和367%的高中子灵敏度。两个电接触之间填充陷阱分布的不平衡可以解释MSM探测器的自偏置操作。通过电偏置进一步提高了中子灵敏度,在200 V和3×10 n/cm/s的通量下,天然和富硼h-BN探测器的中子灵敏度分别达到316%和1192%,在200 V时暗电流低至2.5 pA。偏置下性能的提高归因于基于中子诱导电荷载流子在半导体/金属界面处俘获的增益机制。MSM探测器在热中子通量和偏置电压下的响应是线性的。这些结果清楚地表明,薄膜单晶BN MSM中子探测器可以进行优化,以便在没有外部偏置的情况下灵敏地运行,并使用富硼硼产生更强的信号检测。