Department of Electrical and Computer Engineering, McGill University , 3480 University Street, Montreal, Quebec H3A 0E9, Canada.
Department of Electrical Engineering and Computer Science, Center for Photonics and Multiscale Nanomaterials, University of Michigan , 1301 Beal Avenue, Ann Arbor, Michigan 48109, United States.
Nano Lett. 2017 Jun 14;17(6):3738-3743. doi: 10.1021/acs.nanolett.7b01068. Epub 2017 May 8.
Aluminum-rich AlGaN is the ideal material system for emerging solid-state deep-ultraviolet (DUV) light sources. Devices operating in the near-UV spectral range have been realized; to date, however, the achievement of high-efficiency light-emitting diodes (LEDs) operating in the UV-C band (200-280 nm specifically) has been hindered by the extremely inefficient p-type conduction in AlGaN and the lack of DUV-transparent conductive electrodes. Here, we show that these critical challenges can be addressed by Mg dopant-free Al(Ga)N/h-BN nanowire heterostructures. By exploiting the acceptor-like boron vacancy formation, we have demonstrated that h-BN can function as a highly conductive, DUV-transparent electrode; the hole concentration is ∼10 cm at room temperature, which is 10 orders of magnitude higher than that previously measured for Mg-doped AlN epilayers. We have further demonstrated the first Al(Ga)N/h-BN LED, which exhibits strong emission at ∼210 nm. This work also reports the first achievement of Mg-free III-nitride LEDs that can exhibit high electrical efficiency (80% at 20 A/cm).
富铝 AlGaN 是新兴固态深紫外 (DUV) 光源的理想材料体系。已经实现了在近紫外光谱范围内工作的器件;然而,迄今为止,在 UV-C 波段(具体为 200-280nm)实现高效发光二极管 (LED) 的目标受到 AlGaN 中极低效的 p 型传导以及缺乏 DUV 透明导电电极的阻碍。在这里,我们表明,这些关键挑战可以通过无镁掺杂的 Al(Ga)N/六方氮化硼纳米线异质结构来解决。通过利用类似受体的硼空位形成,我们已经证明 h-BN 可以用作高导电性、DUV 透明电极;室温下的空穴浓度约为 10cm,比之前测量的 Mg 掺杂 AlN 外延层高 10 个数量级。我们进一步展示了第一个 Al(Ga)N/h-BN LED,它在约 210nm 处表现出强烈的发射。这项工作还报告了第一个实现无镁 III 族氮化物 LED 的成果,该 LED 可以表现出高的电效率(在 20A/cm 时为 80%)。