Time-dependent reactive oxygen species inhibit Streptococcus mutans growth on zirconia after a helium cold atmospheric plasma treatment.

As an efficient strategy for the modification of material surfaces, cold atmospheric plasma (CAP) has been used in dentistry to improve hard and soft tissue integration of dental implant materials. We previously found the Streptococcus mutans growth was inhibited on the surface of zirconia implant abutment after a 60-second helium cold atmospheric plasma treatment. However, the mechanism of bacterial growth inhibition on CAP-treated zirconia has not been fully understood. The duration of bacterial inhibition effectiveness on CAP-treated zirconia has also been insufficiently examined. In this work, we assume that reactive oxygen species (ROS) are the primary cause of bacterial inhibition on CAP-treated zirconia. The ROS staining and an ROS scavenger were utilized to evaluate the bacterial intracellular ROS level, and to determine the role of ROS in bacterial growth inhibition when seeded on CAP-treated zirconia. The time-dependent effectiveness of CAP treatment was determined by changes in surface characteristics and antibacterial efficacy of zirconia with different storage times after CAP treatment. This study confirmed that the presence of reactive oxygen species on the zirconia surface after CAP treatment inhibits the growth of Streptococcus mutans on the material surface. Although the antibacterial efficacy of the 60-second CAP-treated zirconia decreased over time, there were fewer bacteria on the treated surface than those on the untreated surface after 14 days.