Kamarundzaman Anas, Abu Bakar Ahmad Shuhaimi, Azman Adreen, Omar Al-Zuhairi, Talik Noor Azrina, Supangat Azzuliani, Abd Majid Wan Haliza
Low Dimensional Materials Research Centre, Department of Physics, Faculty of Science, University of Malaya, 50603, Kuala Lumpur, Malaysia.
Nanotechnology Research Centre, Department of Physics, Faculty of Science and Mathematics, Universiti Pendidikan Sultan Idris, 35900, Tanjong Malim, Perak, Malaysia.
Sci Rep. 2021 May 6;11(1):9724. doi: 10.1038/s41598-021-89201-8.
We demonstrated high-quality single crystalline a-plane undoped-gallium nitride grown on a nonpatterned r-plane sapphire substrate via metal-organic chemical vapor deposition. The effect of four different numbers of sandwiched strain-periodic AlN/GaN multilayers on the strain state, crystal quality, optical and electrical properties was investigated. Field emission scanning electron microscopy and atomic force microscopy showed that the surface morphology was improved upon insertion of 120 pairs of AlN/GaN thin layers with a root-mean-square roughness of 2.15 nm. On-axis X-ray ω-scan rocking curves showed enhanced crystalline quality: the full width at half maximum decreased from 1224 to 756 arcsec along the [0001] direction and from 2628 to 1360 arcsec along the [1-100] direction for a-GaN grown with 120 pairs of AlN/GaN compared to a-GaN without AlN/GaN pairs. Reciprocal space mapping showed that a-plane GaN with a high number of AlN/GaN pairs exhibits near-relaxation strain states. Room-temperature photoluminescence spectra showed that the sample with the highest number of AlN/GaN pairs exhibited the lowest-intensity yellow and blue luminescence bands, indicating a reduction in defects and dislocations. The a-plane InGaN/GaN LEDs with 120 pairs of SSPM-L AlN/GaN exhibited a significant increase (~ 250%) in light output power compared to that of LEDs without SSPM-L AlN/GaN pairs.
我们展示了通过金属有机化学气相沉积在无图案的r面蓝宝石衬底上生长的高质量单晶a面未掺杂氮化镓。研究了四种不同数量的夹芯应变周期性AlN/GaN多层结构对应变状态、晶体质量、光学和电学性质的影响。场发射扫描电子显微镜和原子力显微镜表明,插入120对AlN/GaN薄层后表面形貌得到改善,均方根粗糙度为2.15 nm。轴向X射线ω扫描摇摆曲线显示晶体质量增强:与未生长AlN/GaN对的a-GaN相比,生长有120对AlN/GaN的a-GaN沿[0001]方向的半高宽从1224弧秒降至756弧秒,沿[1-100]方向从2628弧秒降至1360弧秒。倒易空间映射表明,具有大量AlN/GaN对的a面GaN呈现近弛豫应变状态。室温光致发光光谱表明,AlN/GaN对数量最多的样品呈现出最低强度的黄色和蓝色发光带,表明缺陷和位错减少了。与没有SSPM-L AlN/GaN对的发光二极管相比,具有120对SSPM-L AlN/GaN的a面InGaN/GaN发光二极管的光输出功率显著增加(约250%)。