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类石墨烯XBi(X = Si、Ge、Sn)单层的电子、力学和热电性质的第一性原理研究

First-principles investigation of electronic, mechanical and thermoelectric properties of graphene-like XBi (X = Si, Ge, Sn) monolayers.

作者信息

Bafekry Asadollah, Yagmurcukardes Mehmet, Akgenc Berna, Ghergherehchi Mitra, Mortazavi Bohayra

机构信息

Department of Radiation Application, Shahid Beheshti University, Tehran, Iran.

NANOlab Center of Excellence, Groenenborgerlaan 171, B-2020 Antwerp, Belgium and Department of Photonics, Äřzmir Institute of Technology, 35430 Äřzmir, Turkey.

出版信息

Phys Chem Chem Phys. 2021 Jun 2;23(21):12471-12478. doi: 10.1039/d1cp01183a.

DOI:10.1039/d1cp01183a
PMID:34037032
Abstract

Research progress on single layer group III monochalcogenides has been increasing rapidly owing to their interesting physics. Herein, we investigate the dynamically stable single layer forms of XBi (X = Ge, Si or Sn) using density functional theory calculations. Phonon band dispersion calculations and ab initio molecular dynamics simulations reveal the dynamical and thermal stability of the considered monolayers. Raman spectra calculations indicate the existence of 5 Raman active phonon modes, 3 of which are prominent and can be observed in possible Raman measurements. The electronic band structures of the XBi single layers were investigated with and without the effects of spin-orbit coupling (SOC). Our results show that XBi single layers show semiconducting properties with narrow band gap values without SOC. However, only single layer SiBi is an indirect band gap semiconductor, while GeBi and SnBi exhibit metallic behaviors when adding spin-orbit coupling effects. In addition, the calculated linear elastic parameters indicate the soft nature of the predicted monolayers. Moreover, our predictions for the thermoelectric properties of single layer XBi reveal that SiBi is a good thermoelectric material with increasing temperature. Overall, it is proposed that single layer XBi structures can be alternative, stable 2D single layers with varying electronic and thermoelectric properties.

摘要

由于其有趣的物理性质,单层III族硫属化物的研究进展迅速。在此,我们使用密度泛函理论计算研究了XBi(X = Ge、Si或Sn)的动态稳定单层形式。声子能带色散计算和从头算分子动力学模拟揭示了所考虑单层的动态和热稳定性。拉曼光谱计算表明存在5种拉曼活性声子模式,其中3种很突出,可在可能的拉曼测量中观察到。研究了有无自旋轨道耦合(SOC)效应时XBi单层的电子能带结构。我们的结果表明,XBi单层在无SOC时表现出具有窄带隙值的半导体性质。然而,只有单层SiBi是间接带隙半导体,而添加自旋轨道耦合效应时,GeBi和SnBi表现出金属行为。此外,计算得到的线性弹性参数表明所预测单层的柔软性质。而且,我们对单层XBi热电性质的预测表明,SiBi是一种随温度升高热电性能良好的材料。总体而言,有人提出单层XBi结构可以是具有不同电子和热电性质的替代的、稳定的二维单层。

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