Huang Chia-Yen, Hong Kuo-Bin, Huang Zhen-Ting, Hsieh Wen-Hsuan, Huang Wei-Hao, Lu Tien-Chang
Department of Photonics, College of Electrical and Computer Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
Micromachines (Basel). 2021 Jun 9;12(6):676. doi: 10.3390/mi12060676.
Since the first demonstration of (Al, In, Ga)N-based blue vertical-cavity surface-emitting lasers (VCSELs) in 2008, the maximum output power (P) and threshold current density (J) has been improved significantly after a decade of technology advancements. This article reviewed the key challenges for the realization of VCSELs with III-nitride materials, such as inherent polarization effects, difficulties in distributed Bragg's reflectors (DBR) fabrication for a resonant cavity, and the anti-guiding effect due to the deposited dielectrics current aperture. The significant tensile strain between AlN and GaN hampered the intuitive cavity design with two epitaxial DBRs from arsenide-based VCSELs. Therefore, many alternative cavity structures and processing technologies were developed; for example, lattice-matched AlInN/GaN DBR, nano-porous DBR, or double dielectric DBRs via various overgrowth or film transfer processing strategies. The anti-guiding effect was overcome by integrating a fully planar or slightly convex DBR as one of the reflectors. Special designs to limit the emission polarization in a circular aperture were also summarized. Growing VCSELs on low-symmetry non-polar and semipolar planes discriminates the optical gain along different crystal orientations. A deliberately designed high-contrast grating could differentiate the reflectivity between the transverse-electric field and transverse-magnetic field, which restricts the lasing mode to be the one with the higher reflectivity. In the future, the III-nitride based VCSEL shall keep advancing in total power, applicable spectral region, and ultra-low threshold pumping density with the novel device structure design and processing technologies.
自2008年首次展示基于(铝、铟、镓)氮化物的蓝色垂直腔面发射激光器(VCSEL)以来,经过十年的技术进步,其最大输出功率(P)和阈值电流密度(J)有了显著提高。本文回顾了用III族氮化物材料实现VCSEL所面临的关键挑战,例如固有极化效应、用于谐振腔的分布式布拉格反射器(DBR)制造困难以及沉积介质电流孔径引起的反导效应。氮化铝和氮化镓之间的显著拉伸应变阻碍了基于砷化物的VCSEL采用两个外延DBR的直观腔设计。因此,开发了许多替代腔结构和加工技术;例如,通过各种过生长或薄膜转移加工策略实现晶格匹配的铝铟氮/氮化镓DBR、纳米多孔DBR或双介质DBR。通过将完全平面或略微凸起的DBR作为反射器之一来克服反导效应。还总结了在圆形孔径中限制发射极化的特殊设计。在低对称非极性和半极性平面上生长VCSEL会区分沿不同晶体取向的光学增益。精心设计的高对比度光栅可以区分横向电场和横向磁场之间的反射率,从而将激射模式限制为具有较高反射率的模式。未来,基于III族氮化物的VCSEL将通过新颖的器件结构设计和加工技术在总功率、适用光谱区域和超低阈值泵浦密度方面不断取得进展。