Balram Krishna C, Westly Daron A, Davanço Marcelo, Grutter Karen E, Li Qing, Michels Thomas, Ray Christopher H, Yu Liya, Kasica Richard J, Wallin Christopher B, Gilbert Ian J, Bryce Brian A, Simelgor Gregory, Topolancik Juraj, Lobontiu Nicolae, Liu Yuxiang, Neuzil Pavel, Svatos Vojtech, Dill Kristen A, Bertrand Neal A, Metzler Meredith G, Lopez Gerald, Czaplewski David A, Ocola Leonidas, Srinivasan Kartik A, Stavis Samuel M, Aksyuk Vladimir A, Liddle J Alexander, Krylov Slava, Ilic B Robert
National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
University of Maryland, Maryland NanoCenter, College Park, MD 20740 USA.
J Res Natl Inst Stand Technol. 2016 Oct 19;121:464-475. doi: 10.6028/jres.121.024. eCollection 2016.
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.
本文以存档形式介绍了纳米光刻工具箱，这是一个用于脚本化光刻图案布局生成的与平台无关的软件包。美国国家标准与技术研究院（NIST）的纳米尺度科学与技术中心（CNST）开发了纳米光刻工具箱，以帮助CNST纳米制造实验室的用户设计具有复杂曲线和严格关键尺寸的设备。纳米光刻工具箱以参数化形状作为构建模块，允许用户通过脚本编写和编程快速设计和布局任意复杂程度的纳米级设备。该工具箱提供了许多参数化形状，包括用于微机电系统（MEMS）和纳米机电系统（NEMS）以及纳米光子器件的结构库。此外，该工具箱允许用户精确定义每个形状的顶点数量，或使用贝塞尔曲线创建矢量化形状。参数化控制允许用户设计具有复杂形状的平滑曲线。该工具箱适用于微尺度和纳米尺度设备制造中的广泛设计任务。
