Yang Song, Ma Guobin, Xu Lei, Deng Chaoyong, Wang Xu
Guizhou Key Laboratory for Characteristics of Electronic Functional Composites, College of Big Data and Information Engineering, Guizhou University Guiyang 550025 P. R. China
RSC Adv. 2019 Sep 17;9(50):29238-29245. doi: 10.1039/c9ra05914h. eCollection 2019 Sep 13.
Multiferroic BiFe Mn O ( = 0, 0.04, 0.08, 0.12) films have been prepared on Pt/Ti/SiO/Si and ITO/glass substrates the solution-gelation technique. The impacts of Mn doping of BFO thin films on the structure, morphology, leakage current, ferroelectric properties and optical band gap have been systematic investigated. From the XRD patterns, all samples match well with the perovskite structure without an impurity phase and the thin films exhibit dense and smooth microstructure. A leakage current density of 1.10 × 10 A cm which is about four orders of magnitude lower than that of pure BiFeO was observed for the 8% Mn doped BFO thin film at an external electric field <150 kV cm. An increase in the remnant polarization with Mn substitution was observed, with a maximum value of ∼19 μC cm for the 8% Mn-substituted film. Moreover, optical absorption spectra indicate that the doping of Mn has an effect on the energy band structure. Compared with pure BiFeO, Mn doped thin films present an intense red shift as shown in the UV-visible diffuse absorption together with the decreased direct and indirect optical band gaps. In addition, this work gives insight into the relationship between ferroelectric remnant polarization and band-gap and finds that the optical band gap decreases with the increase of residual polarization.
采用溶液凝胶法在Pt/Ti/SiO₂/Si和ITO/玻璃衬底上制备了多铁性BiFe₁₋ₓMnₓO₃(x = 0, 0.04, 0.08, 0.12)薄膜。系统研究了BFO薄膜中Mn掺杂对其结构、形貌、漏电流、铁电性能和光学带隙的影响。从XRD图谱可知,所有样品均与钙钛矿结构匹配良好,无杂质相,且薄膜呈现致密光滑的微观结构。在外部电场<150 kV/cm时,8% Mn掺杂的BFO薄膜的漏电流密度为1.10×10⁻⁶ A/cm²,比纯BiFeO₃的漏电流密度低约四个数量级。观察到随着Mn取代,剩余极化增加,8% Mn取代的薄膜的最大值约为19 μC/cm²。此外,光学吸收光谱表明Mn掺杂对能带结构有影响。与纯BiFeO₃相比,Mn掺杂薄膜在紫外可见漫反射吸收中呈现强烈的红移,同时直接和间接光学带隙减小。此外,这项工作深入了解了铁电剩余极化与带隙之间的关系,并发现光学带隙随着剩余极化的增加而减小。