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通过具有取向偏差校正的电子叠层成像实现深度亚埃分辨率成像。

Deep sub-angstrom resolution imaging by electron ptychography with misorientation correction.

作者信息

Sha Haozhi, Cui Jizhe, Yu Rong

机构信息

National Center for Electron Microscopy in Beijing, Tsinghua University, Beijing 100084, China.

Key Laboratory of Advanced Materials of Ministry of Education of China, Tsinghua University, Beijing 100084, China.

出版信息

Sci Adv. 2022 May 13;8(19):eabn2275. doi: 10.1126/sciadv.abn2275.

Abstract

Superresolution imaging of solids is essential to explore local symmetry breaking and derived material properties. Electron ptychography is one of the most promising schemes to realize superresolution imaging beyond aberration correction. However, to reach both deep sub-angstrom resolution imaging and accurate measurement of atomic structures, it is still required for the electron beam to be nearly parallel to the zone axis of crystals. Here, we report an efficient and robust method to correct the specimen misorientation in electron ptychography, giving deep sub-angstrom resolution for specimens with large misorientations. The method largely reduces the experimental difficulties of electron ptychography and paves the way for widespread applications of ptychographic deep sub-angstrom resolution imaging.

摘要

固体的超分辨率成像对于探索局部对称性破缺和衍生材料特性至关重要。电子叠层成像术是实现超越像差校正的超分辨率成像最有前景的方案之一。然而,要实现深度亚埃分辨率成像和原子结构的精确测量,仍要求电子束几乎平行于晶体的晶带轴。在此,我们报告了一种在电子叠层成像术中校正样品取向偏差的高效且稳健的方法,可为具有大取向偏差的样品提供深度亚埃分辨率。该方法大大降低了电子叠层成像术的实验难度,并为叠层深度亚埃分辨率成像的广泛应用铺平了道路。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/cda0/9106290/3f21541d35da/sciadv.abn2275-f1.jpg

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