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用于忆阻器交叉阵列的非晶氧化铟锌锡基选择器器件

Amorphous ITZO-Based Selector Device for Memristor Crossbar Array.

作者信息

Kim Ki Han, Seo Min-Jae, Jang Byung Chul

机构信息

School of Electronic and Electrical Engineering, Kyungpook National University, 80 Daehakro, Bukgu, Daegu 41566, Republic of Korea.

Department of Electronic Engineering, Gachon University, 1342 Seongnam-daero, Seongnam 13120, Republic of Korea.

出版信息

Micromachines (Basel). 2023 Feb 22;14(3):506. doi: 10.3390/mi14030506.

Abstract

In the era of digital transformation, a memristor and memristive circuit can provide an advanced computer architecture that efficiently processes a vast quantity of data. With the unique characteristic of memristor, a memristive crossbar array has been utilized for realization of nonvolatile memory, logic-in-memory circuit, and neuromorphic system. However, the crossbar array architecture suffers from leakage of current, known as the sneak current, which causes a cross-talk interference problem between adjacent memristor devices, leading to an unavoidable operational error and high power consumption. Here, we present an amorphous In-Sn-Zn-O (a-ITZO) oxide semiconductor-based selector device to address the sneak current issue. The a-ITZO-selector device is realized with the back-to-back Schottky diode with nonlinear current-voltage (I-V) characteristics. Its nonlinearity is dependent on the oxygen plasma treatment process which can suppress the surface electron accumulation layer arising on the a-ITZO surface. The a-ITZO-selector device shows reliable characteristics against electrical stress and high temperature. In addition, the selector device allows for a stable read margin over 1 Mbit of memristor crossbar array. The findings may offer a feasible solution for the development of a high-density memristor crossbar array.

摘要

在数字转型时代,忆阻器和忆阻电路能够提供一种先进的计算机架构,可高效处理大量数据。凭借忆阻器的独特特性,忆阻交叉阵列已被用于实现非易失性存储器、内存逻辑电路和神经形态系统。然而,交叉阵列架构存在电流泄漏问题,即所谓的潜行电流,这会导致相邻忆阻器器件之间产生串扰干扰问题,进而导致不可避免的操作错误和高功耗。在此,我们提出一种基于非晶铟锡锌氧化物(a-ITZO)半导体的选择器器件来解决潜行电流问题。a-ITZO选择器器件是通过具有非线性电流-电压(I-V)特性的背靠背肖特基二极管实现的。其非线性取决于氧等离子体处理工艺,该工艺可抑制a-ITZO表面出现的表面电子积累层。a-ITZO选择器器件在电应力和高温下表现出可靠的特性。此外,该选择器器件可使忆阻器交叉阵列在超过1 Mbit的情况下具有稳定的读取裕度。这些发现可能为高密度忆阻器交叉阵列的开发提供一种可行的解决方案。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2250/10054342/1f2eef34d006/micromachines-14-00506-g001.jpg

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