Kim Hye-Lee, Hidayat Romel, Khumaini Khabib, Lee Won-Jun
Metal-organic Compounds Materials Research Center, Sejong University, Seoul, 05006, Republic of Korea.
Departments of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul, 05006, Republic of Korea.
Phys Chem Chem Phys. 2023 Aug 23;25(33):22250-22257. doi: 10.1039/d3cp02009f.
Tetrakis(dimethylamino)-titanium (TDMAT, Ti(NMe)) has been used for the low-temperature atomic layer deposition (ALD) process of titanium oxide (TiO) films. In this study, the chemisorption of TDMAT on a titanium oxide surface using a slab model was simulated by density functional theory (DFT) calculation. We calculated the activation energy for the chemisorption and predicted the final chemisorbed species. A TiO slab model was constructed with the optimized number of -OH surface groups. Three serial ligand exchange reactions between a TDMAT molecule and the TiO slab were exothermic with low activation energies of 0.16-0.46 eV, which can explain the low processing temperatures of the ALD TiO processes. Our DFT calculation showed that three NMe ligands of TDMAT would be released and the surface species of -TiNMe would be formed, which is in good agreement with the experimental observation in the literature.
四(二甲氨基)钛(TDMAT,Ti(NMe)₄)已被用于氧化钛(TiO₂)薄膜的低温原子层沉积(ALD)工艺。在本研究中,通过密度泛函理论(DFT)计算,利用平板模型模拟了TDMAT在氧化钛表面的化学吸附。我们计算了化学吸附的活化能,并预测了最终的化学吸附物种。构建了具有优化数量的-OH表面基团的TiO₂平板模型。TDMAT分子与TiO₂平板之间的三个连续配体交换反应是放热的,活化能较低,为0.16 - 0.46 eV,这可以解释ALD TiO₂工艺的低处理温度。我们的DFT计算表明,TDMAT的三个NMe配体会被释放,并形成-TiNMe表面物种,这与文献中的实验观察结果非常吻合。