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碳化硅合成过程中顺磁缺陷的形成

Formation of Paramagnetic Defects in the Synthesis of Silicon Carbide.

作者信息

Mukesh Nain, Márkus Bence G, Jegenyes Nikoletta, Bortel Gábor, Bezerra Sarah M, Simon Ferenc, Beke David, Gali Adam

机构信息

Institute of Physics, ELTE Eötvös Loránd University, Egyetem tér 1-3., H-1053 Budapest, Hungary.

Wigner Research Centre for Physics, Institute for Solid State Physics and Optics, H-1525 Budapest, Hungary.

出版信息

Micromachines (Basel). 2023 Jul 28;14(8):1517. doi: 10.3390/mi14081517.

Abstract

Silicon carbide (SiC) is a very promising platform for quantum information processing, as it can host room temperature solid state defect quantum bits. These room temperature quantum bits are realized by paramagnetic silicon vacancy and divacancy defects in SiC that are typically introduced by irradiation techniques. However, irradiation techniques often introduce unwanted defects near the target quantum bit defects that can be detrimental for the operation of quantum bits. Here, we demonstrate that by adding aluminum precursor to the silicon and carbon sources, quantum bit defects are created in the synthesis of SiC without any post treatments. We optimized the synthesis parameters to maximize the paramagnetic defect concentrations-including already established defect quantum bits-monitored by electron spin resonance spectroscopy.

摘要

碳化硅(SiC)是用于量子信息处理的一个非常有前景的平台,因为它可以承载室温固态缺陷量子比特。这些室温量子比特是由碳化硅中的顺磁性硅空位和双空位缺陷实现的,这些缺陷通常通过辐照技术引入。然而,辐照技术常常会在目标量子比特缺陷附近引入有害缺陷,这可能对量子比特的运行产生不利影响。在此,我们证明,通过在硅源和碳源中添加铝前驱体,在碳化硅合成过程中无需任何后处理就能产生量子比特缺陷。我们优化了合成参数,以最大化顺磁性缺陷浓度,包括通过电子自旋共振光谱监测的已有的缺陷量子比特。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9ca2/10456762/a28689b1a393/micromachines-14-01517-g001.jpg

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