Singh Kritika, Rout Surya Snata, Krywka Christina, Davydok Anton
Institute of Material Physics, Hemholtz-Zentrum Hereon, Outstation at DESY Notkestr 85, 22607 Hamburg, Germany.
School of Earth and Planetary Sciences, National Institute of Science Education and Research, HBNI, Jatani 752050, India.
Materials (Basel). 2023 Nov 18;16(22):7220. doi: 10.3390/ma16227220.
A focused ion beam scanning electron microscope (FIB-SEM) is a powerful tool that is routinely used for scale imaging from the micro- to nanometer scales, micromachining, prototyping, and metrology. In spite of the significant capabilities of a FIB-SEM, there are inherent artefacts (e.g., structural defects, chemical interactions and phase changes, ion implantation, and material redeposition) that are produced due to the interaction of Ga or other types of ions (e.g., Xe, Ar, O, etc.) with the sample. In this study, we analyzed lattice distortion and ion implantation and subsequent material redeposition in metallic micropillars which were prepared using plasma focus ion beam (PFIB) milling. We utilized non-destructive synchrotron techniques such as X-ray fluorescence (XRF) and X-ray nanodiffraction to examine the micropillars prepared using Xe ion energies of 10 keV and 30 keV. Our results demonstrate that higher Xe ion energy leads to higher density of implanted ions within the redeposited and milled material. The mixing of ions in the redeposited material significantly influences the lattice structure, causing deformation in regions with higher ion concentrations. Through an X-ray nanodiffraction analysis, we obtained numerical measurements of the strain fields induced in the regions, which revealed up to 0.2% lattice distortion in the ion bombardment direction.
聚焦离子束扫描电子显微镜（FIB-SEM）是一种功能强大的工具，常用于从微米到纳米尺度的成像、微加工、原型制作和计量。尽管FIB-SEM具有显著的功能，但由于Ga或其他类型的离子（如Xe、Ar、O等）与样品相互作用，会产生一些固有伪像（如结构缺陷、化学相互作用和相变、离子注入和材料再沉积）。在本研究中，我们分析了使用等离子体聚焦离子束（PFIB）铣削制备的金属微柱中的晶格畸变、离子注入以及随后的材料再沉积。我们利用X射线荧光（XRF）和X射线纳米衍射等非破坏性同步加速器技术来检查使用10 keV和30 keV的Xe离子能量制备的微柱。我们的结果表明，较高的Xe离子能量会导致再沉积和铣削材料中注入离子的密度更高。再沉积材料中离子的混合会显著影响晶格结构，在离子浓度较高的区域会导致变形。通过X射线纳米衍射分析，我们获得了这些区域中诱导应变场的数值测量结果，结果显示在离子轰击方向上晶格畸变高达0.2%。
