Martins Raquel Azevedo, Carlos Emanuel, Kiazadeh Asal, Martins Rodrigo, Deuermeier Jonas
CENIMAT|i3N, Department of Materials Science, School of Science and Technology, NOVA University Lisbon and CEMOP/UNINOVA, 2829-516 Caparica, Portugal.
ACS Appl Eng Mater. 2024 Jan 24;2(2):298-304. doi: 10.1021/acsaenm.3c00535. eCollection 2024 Feb 23.
Solution-based memristors have gained significant attention in recent years due to their potential for the low-cost, scalable, and environmentally friendly fabrication of resistive switching devices. This study is focused on the fabrication and characterization of solution-based molybdenum trioxide (MoO) memristors under different annealing temperatures (200 to 400 °C). A MoO ink recipe is developed using water as the main solvent, enabling a simplified and cost-effective fabrication process. Material analysis reveals the presence of a Mo oxidation state and an amorphous structure in the films annealed up to 250 °C. Electrical tests confirm a bipolar resistive switching behavior in the memristors according to the valence change mechanism (VCM). Endurance tests demonstrate stable memristors, indicating their robust nature after multiple cycles. Memristors annealed at 250 °C exhibit a nonvolatile behavior with a retention time up to 10 s under ambient air conditions. The high reproducibility observed in these memristors highlights their potential for practical applications and scalability.
近年来,基于溶液的忆阻器因其在低成本、可扩展且环保的电阻式开关器件制造方面的潜力而备受关注。本研究聚焦于不同退火温度(200至400°C)下基于溶液的三氧化钼(MoO)忆阻器的制造与表征。采用水作为主要溶剂开发了一种MoO墨水配方,实现了简化且经济高效的制造工艺。材料分析表明,在高达250°C退火的薄膜中存在Mo氧化态和非晶结构。电学测试根据价态变化机制(VCM)证实了忆阻器中的双极电阻开关行为。耐久性测试表明忆阻器性能稳定,表明其在多次循环后具有稳健的特性。在250°C退火的忆阻器在环境空气条件下表现出非易失性行为,保持时间长达10秒。这些忆阻器中观察到的高再现性突出了它们在实际应用和可扩展性方面的潜力。