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拓扑绝缘体与铁磁体范德华异质结构中的高效室温自旋轨道矩开关

Highly Efficient Room-Temperature Spin-Orbit-Torque Switching in a Van der Waals Heterostructure of Topological Insulator and Ferromagnet.

作者信息

Choi Gyu Seung, Park Sungyu, An Eun-Su, Bae Juhong, Shin Inseob, Kang Beom Tak, Won Choong Jae, Cheong Sang-Wook, Lee Hyun-Woo, Lee Gil-Ho, Cho Won Joon, Kim Jun Sung

机构信息

Department of Physics, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea.

Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang, 37673, Republic of Korea.

出版信息

Adv Sci (Weinh). 2024 Jun;11(21):e2400893. doi: 10.1002/advs.202400893. Epub 2024 Mar 22.

Abstract

All-Van der Waals (vdW)-material-based heterostructures with atomically sharp interfaces offer a versatile platform for high-performing spintronic functionalities at room temperature. One of the key components is vdW topological insulators (TIs), which can produce a strong spin-orbit-torque (SOT) through the spin-momentum locking of their topological surface state (TSS). However, the relatively low conductance of the TSS introduces a current leakage problem through the bulk states of the TI or the adjacent ferromagnetic metal layers, reducing the interfacial charge-to-spin conversion efficiency (q). Here, a vdW heterostructure is used consisting of atomically-thin layers of a bulk-insulating TI Sn-doped BiSbTeS and a room-temperature ferromagnet FeGaTe to enhance the relative current ratio on the TSS up to ≈20%. The resulting q reaches ≈1.65 nm and the critical current density J ≈0.9 × 10 Acm at 300 K, surpassing the performance of TI-based and heavy-metal-based SOT devices. These findings demonstrate that an all-vdW heterostructure with thickness optimization offers a promising platform for efficient current-controlled magnetization switching at room temperature.

摘要

所有具有原子级清晰界面的基于范德瓦尔斯(vdW)材料的异质结构,为室温下高性能自旋电子功能提供了一个通用平台。关键组件之一是vdW拓扑绝缘体(TI),它可以通过其拓扑表面态(TSS)的自旋动量锁定产生强大的自旋轨道扭矩(SOT)。然而,TSS相对较低的电导率会通过TI的体态或相邻的铁磁金属层引入电流泄漏问题,降低界面电荷到自旋的转换效率(q)。在此,使用了一种vdW异质结构,它由体绝缘TI掺锡BiSbTeS的原子薄层和室温铁磁体FeGaTe组成,以将TSS上的相对电流比提高到约20%。在300 K时,所得的q达到约1.65 nm,临界电流密度J约为0.9×10 A/cm,超过了基于TI和基于重金属的SOT器件的性能。这些发现表明,经过厚度优化的全vdW异质结构为室温下高效的电流控制磁化切换提供了一个有前景的平台。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5af5/11151020/7c9bbb40cdbe/ADVS-11-2400893-g003.jpg

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