Park Taeho, Cho Kyoungah, Kim Sangsig
Department of Electrical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea.
Nanomaterials (Basel). 2024 Mar 9;14(6):493. doi: 10.3390/nano14060493.
In this study, we examine the electrical characteristics of triple-gate feedback field-effect transistors (TG FBFETs) over a temperature range of -200 °C to 280 °C. With increasing temperature from 25 °C to 280 °C, the thermally generated charge carriers increase in the channel regions such that a positive feedback loop forms rapidly. Thus, the latch-up voltage shifts from -1.01 V (1.34 V) to -11.01 V (10.45 V) in the -channel (-channel) mode. In contrast, with decreasing temperature from 25 °C to -200 °C, the thermally generated charge carriers decrease, causing a shift in the latch-up voltage in the opposite direction to that of the increasing temperature case. Despite the shift in the latch-up voltage, the TG FBFETs exhibit ideal switching characteristics, with subthreshold swings of 6.6 mV/dec and 7.2 mV/dec for the -channel and -channel modes, respectively. Moreover, the memory window widens with increasing temperature. Specifically, at temperatures above 85 °C, the memory windows are wider than 3.05 V and 1.42 V for the -channel and -channel modes, respectively.
在本研究中,我们研究了三栅极反馈场效应晶体管(TG FBFET)在-200°C至280°C温度范围内的电学特性。随着温度从25°C升高到280°C,沟道区域内热产生的电荷载流子增加,从而迅速形成正反馈回路。因此,在n沟道(p沟道)模式下,闩锁电压从-1.01V(1.34V)变为-11.01V(10.45V)。相反,随着温度从25°C降低到-200°C,热产生的电荷载流子减少,导致闩锁电压的变化方向与温度升高的情况相反。尽管闩锁电压发生了变化,但TG FBFET仍表现出理想的开关特性,n沟道和p沟道模式的亚阈值摆幅分别为6.6mV/dec和7.2mV/dec。此外,记忆窗口随温度升高而变宽。具体而言,在85°C以上的温度下,n沟道和p沟道模式的记忆窗口分别宽于3.05V和1.42V。